TY - JOUR
T1 - Auxiliary capacitor to enhance oscillation in circuit and reduce current onset delay in HiPIMS discharge
T2 - Theory, experiment and simulation
AU - Han, Mingyue
AU - Luo, Yang
AU - Li, Hua
AU - Li, Liu He
AU - Xu, Ye
AU - Luo, Sida
AU - Zhang, Peipei
AU - Xu, Hao
AU - Xu, Changyun
N1 - Publisher Copyright:
© 2020 Elsevier B.V.
PY - 2021/1/15
Y1 - 2021/1/15
N2 - In high power impulse magnetron sputtering (HiPIMS) discharge, generally, the current onset lags the applied pulse voltage by a significant time which can reach to several tens of microseconds, especially at a low gas pressure. The existence of this delay will affect the instantaneous and average power, and in turn, it determines the plasma dynamics and the thin film properties. The origin of current onset delay can be traced back to gas breakdown in E × B fields. This work firstly focuses on the theory and model of gas breakdown in the HiPIMS discharge with parallel electrodes. Theoretically, the breakdown voltage of argon in HiPIMS is about −700 V at gas pressure of 0.45 Pa, while it can exceed −1100 V at pressure of 0.4 Pa. To operate the HiPIMS at a low pressure with a short delay time of current onset, the means using an auxiliary capacitor C connected in parallel with plasma between electrodes to enhance oscillation in circuit (named ECO-HiPIMS) is employed, which can generate a high oscillation voltage during the gas breakdown phase. Choosing a suitable capacitor, this oscillation voltage reaches up to −1322 V at applied pulse voltage of −700 V, and in turn, the delay time can be shortened from around 50 μs (in standard HiPIMS) to less than 5 μs. Finally, the plasma dynamics during gas breakdown phase in HiPIMS and ECO-HiPIMS has been investigated by a two-dimension particle in cell/Monte Carlo (2D PIC-MCC) simulation.
AB - In high power impulse magnetron sputtering (HiPIMS) discharge, generally, the current onset lags the applied pulse voltage by a significant time which can reach to several tens of microseconds, especially at a low gas pressure. The existence of this delay will affect the instantaneous and average power, and in turn, it determines the plasma dynamics and the thin film properties. The origin of current onset delay can be traced back to gas breakdown in E × B fields. This work firstly focuses on the theory and model of gas breakdown in the HiPIMS discharge with parallel electrodes. Theoretically, the breakdown voltage of argon in HiPIMS is about −700 V at gas pressure of 0.45 Pa, while it can exceed −1100 V at pressure of 0.4 Pa. To operate the HiPIMS at a low pressure with a short delay time of current onset, the means using an auxiliary capacitor C connected in parallel with plasma between electrodes to enhance oscillation in circuit (named ECO-HiPIMS) is employed, which can generate a high oscillation voltage during the gas breakdown phase. Choosing a suitable capacitor, this oscillation voltage reaches up to −1322 V at applied pulse voltage of −700 V, and in turn, the delay time can be shortened from around 50 μs (in standard HiPIMS) to less than 5 μs. Finally, the plasma dynamics during gas breakdown phase in HiPIMS and ECO-HiPIMS has been investigated by a two-dimension particle in cell/Monte Carlo (2D PIC-MCC) simulation.
KW - Current onset delay
KW - ECO-HiPIMS
KW - Gas breakdown
KW - HiPIMS
KW - PIC-MCC simulation
UR - https://www.scopus.com/pages/publications/85094915673
U2 - 10.1016/j.surfcoat.2020.126518
DO - 10.1016/j.surfcoat.2020.126518
M3 - 文章
AN - SCOPUS:85094915673
SN - 0257-8972
VL - 405
JO - Surface and Coatings Technology
JF - Surface and Coatings Technology
M1 - 126518
ER -