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Analysis of on-chip metal micro-electrode for CMOS ISFETs

  • Beihang University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

In this paper the usage of an on-chip metal electrode for CMOS ISFET has been analysed. It is firstly shown that metal electrode can not provide constant potential as other conventional electrodes. Besides that this paper demonstrates the ions distribution and its corresponding deviated potential when ISFETs are detecting extreme small volume. Finally a 2-D simulation result indicates the potential gradient when a vertical on-chip electrode is applied and suggests that a minimum distance of 2um is desired for robust ISFET design with on-chip electrode.

源语言英语
主期刊名2019 IEEE International Symposium on Circuits and Systems, ISCAS 2019 - Proceedings
出版商Institute of Electrical and Electronics Engineers Inc.
ISBN(电子版)9781728103976
DOI
出版状态已出版 - 2019
活动2019 IEEE International Symposium on Circuits and Systems, ISCAS 2019 - Sapporo, 日本
期限: 26 5月 201929 5月 2019

出版系列

姓名Proceedings - IEEE International Symposium on Circuits and Systems
2019-May
ISSN(印刷版)0271-4310

会议

会议2019 IEEE International Symposium on Circuits and Systems, ISCAS 2019
国家/地区日本
Sapporo
时期26/05/1929/05/19

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