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Ab InitioStudy of Hexagonal Boron Nitride as the Tunnel Barrier in Magnetic Tunnel Junctions

  • Haichang Lu
  • , Yuzheng Guo
  • , John Robertson*
  • *此作品的通讯作者
  • University of Cambridge
  • Swansea University

科研成果: 期刊稿件文章同行评审

摘要

Two-dimensional hexagonal boron nitride (h-BN) is studied as a tunnel barrier in magnetic tunnel junctions (MTJs) as a possible alternative to MgO. The tunnel magnetoresistance (TMR) of such MTJs is calculated as a function of whether the interface involves the chemi- or physisorptive site of h-BN atoms on the metal electrodes, Fe, Co, or Ni. It is found that the physisorptive site on average produces higher TMR values, whereas the chemisorptive site has the greater binding energy but lower TMR. It is found that alloying the electrodes with an inert metal-like Pt can induce the preferred absorption site on Co to become a physisorptive site, enabling a higher TMR value. It is found that the choice of physisorptive sites of each element gives more Schottky-like dependence of their Schottky barrier heights on the metal work function.

源语言英语
页(从-至)47226-47235
页数10
期刊ACS Applied Materials and Interfaces
13
39
DOI
出版状态已出版 - 6 10月 2021

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