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A novel positioning stage with resolution enhancement functionality for nano manipulation

  • Chong Du
  • , Weihai Chen
  • , Xiantao Sun
  • , Yunjie Wu
  • , Jianbin Zhang
  • , Wenjie Chen

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

With the rapid development of nano science and precision engineering, a positioning system with high resolution is indispensable to meet the requirement of precise positioning. This paper presents the design and modeling of a flexure-based positioning stage with the functionality of resolution enhancement. To achieve high enhancement ratio, two sets of displacement reduction mechanisms are incorporated and configured serially in a monolithic symmetrical design. Following the assumption that the flexure hinge can be equivalent to an ideal revolute joint with a torsional spring, theoretical models are established to analyze the resolution enhancement ratio and dynamic performance of the positioning stage. Moreover, finite element analysis (FEA) is conducted to study the performances of the mechanism and verify the theoretical models. The results show that the proposed mechanism can achieve a resolution enhancement ratio of 18.75 to improve the positioning performance, and the first order natural frequency of the mechanism is 535.5Hz, which guarantees the bandwidth of the positioning operation.

源语言英语
主期刊名2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings
出版商IEEE Computer Society
170-175
页数6
ISBN(印刷版)9781479912131
DOI
出版状态已出版 - 2013
活动2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Suzhou, 中国
期限: 26 8月 201330 8月 2013

出版系列

姓名2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013 - Conference Proceedings

会议

会议2013 International Conference on Manipulation, Manufacturing and Measurement on the Nanoscale, 3M-NANO 2013
国家/地区中国
Suzhou
时期26/08/1330/08/13

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