A Monte Carlo simulation model for surface evolution by plasma etching

Fangfang Chen; Kaigui Zhu; Aqing Chen; Weijie Huang; Lishuang Feng; Zhen Zhou; Guanglu Ge

doi:10.1016/j.apsusc.2013.04.171

A Monte Carlo simulation model for surface evolution by plasma etching

Fangfang Chen
, Kaigui Zhu^*
, Aqing Chen
, Weijie Huang
, Lishuang Feng
, Zhen Zhou
, Guanglu Ge

^*此作品的通讯作者

Beihang University
National Center for Nanoscience and Technology

科研成果: 期刊稿件 › 文章 › 同行评审

5 引用（Scopus）

摘要

A Monte Carlo simulation model, i.e. sputtering etch model, was established with Monte Carlo method to simulate plasma etching induced surface morphology evolution. The surface morphology images and fractal exponents were obtained, with α = 0.5, β = 0.27, z = 1.76. Germanium samples were etched in SF ₆ plasma and the post-etch surface was analyzed in order to compare with the model. The surface morphology images and fractal exponents by simulation describe the experimental results very well.

源语言	英语
页（从-至）	655-659
页数	5
期刊	Applied Surface Science
卷	280
DOI	https://doi.org/10.1016/j.apsusc.2013.04.171
出版状态	已出版 - 1 9月 2013

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10.1016/j.apsusc.2013.04.171

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title = "A Monte Carlo simulation model for surface evolution by plasma etching",

abstract = " A Monte Carlo simulation model, i.e. sputtering etch model, was established with Monte Carlo method to simulate plasma etching induced surface morphology evolution. The surface morphology images and fractal exponents were obtained, with α = 0.5, β = 0.27, z = 1.76. Germanium samples were etched in SF 6 plasma and the post-etch surface was analyzed in order to compare with the model. The surface morphology images and fractal exponents by simulation describe the experimental results very well.",

keywords = "Monte Carlo method, Plasma etching, Simulation, Surface morphology",

author = "Fangfang Chen and Kaigui Zhu and Aqing Chen and Weijie Huang and Lishuang Feng and Zhen Zhou and Guanglu Ge",

year = "2013",

month = sep,

day = "1",

doi = "10.1016/j.apsusc.2013.04.171",

language = "英语",

volume = "280",

pages = "655--659",

journal = "Applied Surface Science",

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TY - JOUR

T1 - A Monte Carlo simulation model for surface evolution by plasma etching

AU - Chen, Fangfang

AU - Zhu, Kaigui

AU - Chen, Aqing

AU - Huang, Weijie

AU - Feng, Lishuang

AU - Zhou, Zhen

AU - Ge, Guanglu

PY - 2013/9/1

Y1 - 2013/9/1

N2 - A Monte Carlo simulation model, i.e. sputtering etch model, was established with Monte Carlo method to simulate plasma etching induced surface morphology evolution. The surface morphology images and fractal exponents were obtained, with α = 0.5, β = 0.27, z = 1.76. Germanium samples were etched in SF 6 plasma and the post-etch surface was analyzed in order to compare with the model. The surface morphology images and fractal exponents by simulation describe the experimental results very well.

AB - A Monte Carlo simulation model, i.e. sputtering etch model, was established with Monte Carlo method to simulate plasma etching induced surface morphology evolution. The surface morphology images and fractal exponents were obtained, with α = 0.5, β = 0.27, z = 1.76. Germanium samples were etched in SF 6 plasma and the post-etch surface was analyzed in order to compare with the model. The surface morphology images and fractal exponents by simulation describe the experimental results very well.

KW - Monte Carlo method

KW - Plasma etching

KW - Simulation

KW - Surface morphology

UR - https://www.scopus.com/pages/publications/84879696461

U2 - 10.1016/j.apsusc.2013.04.171

DO - 10.1016/j.apsusc.2013.04.171

M3 - 文章

AN - SCOPUS:84879696461

SN - 0169-4332

VL - 280

SP - 655

EP - 659

JO - Applied Surface Science

JF - Applied Surface Science

ER -

A Monte Carlo simulation model for surface evolution by plasma etching

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