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3D KMC reliability simulation of nano-scaled HKMG nMOSFETs with multiple traps coupling

  • Yun Li
  • , Zhiyuan Lun
  • , Peng Huang
  • , Yijiao Wang
  • , Hai Jiang
  • , Gang Du
  • , Xiaoyan Liu
  • Peking University

科研成果: 书/报告/会议事项章节会议稿件同行评审

摘要

This paper presents coupling characteristics of multiple traps in HKMG nMOSFETs by a 3D kinetic Monte-Carlo (KMC) simulator we developed, which includes several fully-coupled multi-physical models: trap generation/recombination, trapping/detrapping to/from channel, metal gate, and the interaction of traps. It shows that activation energy and trapping/detrapping from/to channel/gate impact on coupling of multiple traps. Interaction of traps complicates mechanism in TAT current, BTI, and RTN.

源语言英语
主期刊名2015 International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2015
出版商Institute of Electrical and Electronics Engineers Inc.
148-151
页数4
ISBN(电子版)9781467378581
DOI
出版状态已出版 - 5 10月 2015
已对外发布
活动20th International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2015 - Washington, 美国
期限: 9 9月 201511 9月 2015

出版系列

姓名International Conference on Simulation of Semiconductor Processes and Devices, SISPAD
2015-October

会议

会议20th International Conference on Simulation of Semiconductor Processes and Devices, SISPAD 2015
国家/地区美国
Washington
时期9/09/1511/09/15

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