防溅射靶对离子推力器背溅射沉积污染的影响

Shengfei Shang; Shuhong Xiang; Lixiang Jiang; Guobiao Cai; Zuo Gu

doi:10.13224/j.cnki.jasp.2019.05.024

防溅射靶对离子推力器背溅射沉积污染的影响

Shengfei Shang
, Shuhong Xiang
, Lixiang Jiang
, Guobiao Cai
, Zuo Gu

宇航学院

China Aerospace Science and Technology Corporation
Chinese Academy of Sciences

科研成果: 期刊稿件 › 文章 › 同行评审

1 引用（Scopus）

摘要

Considering very large error of current back sputtering model, a model of higher accuracy was proposed. A improved ion current density model was used to calculate the back sputtering deposition in the 80cm position deviating from the thruster while the Reynolds model had a big error. The calculated results agreed well with the experiment result. Then, the verified model was used to calculate the back sputtering deposition of bare chamber and the chamber with anti-sputtering target. The results showed that, the deposition rate of bare chamber case was 2.36×10^-10g/(cm²•s), while the anti-sputtering target shield case was 2.51×10^-11g/(cm²•s). It was clear that the back sputtering deposition yield with anti-sputtering target shield was an order of magnitude lower than the vacuum chamber without the anti-sputtering target.

投稿的翻译标题	Influence of anti-sputtering target on ion thruster back sputtering deposition
源语言	繁体中文
页（从-至）	1178-1184
页数	7
期刊	Hangkong Dongli Xuebao/Journal of Aerospace Power
卷	34
期	5
DOI	https://doi.org/10.13224/j.cnki.jasp.2019.05.024
出版状态	已出版 - 1 5月 2019

关键词

Anti-sputtering target
Back sputtering deposition pollution
Ion thruster
Plume
Quartz crystal microbalance

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10.13224/j.cnki.jasp.2019.05.024

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链接到 Scopus 的出版物

引用此

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title = "防溅射靶对离子推力器背溅射沉积污染的影响",

abstract = "Considering very large error of current back sputtering model, a model of higher accuracy was proposed. A improved ion current density model was used to calculate the back sputtering deposition in the 80cm position deviating from the thruster while the Reynolds model had a big error. The calculated results agreed well with the experiment result. Then, the verified model was used to calculate the back sputtering deposition of bare chamber and the chamber with anti-sputtering target. The results showed that, the deposition rate of bare chamber case was 2.36×10-10g/(cm2•s), while the anti-sputtering target shield case was 2.51×10-11g/(cm2•s). It was clear that the back sputtering deposition yield with anti-sputtering target shield was an order of magnitude lower than the vacuum chamber without the anti-sputtering target.",

keywords = "Anti-sputtering target, Back sputtering deposition pollution, Ion thruster, Plume, Quartz crystal microbalance",

author = "Shengfei Shang and Shuhong Xiang and Lixiang Jiang and Guobiao Cai and Zuo Gu",

year = "2019",

month = may,

day = "1",

doi = "10.13224/j.cnki.jasp.2019.05.024",

language = "繁体中文",

volume = "34",

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journal = "Hangkong Dongli Xuebao/Journal of Aerospace Power",

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TY - JOUR

T1 - 防溅射靶对离子推力器背溅射沉积污染的影响

AU - Shang, Shengfei

AU - Xiang, Shuhong

AU - Jiang, Lixiang

AU - Cai, Guobiao

AU - Gu, Zuo

PY - 2019/5/1

Y1 - 2019/5/1

N2 - Considering very large error of current back sputtering model, a model of higher accuracy was proposed. A improved ion current density model was used to calculate the back sputtering deposition in the 80cm position deviating from the thruster while the Reynolds model had a big error. The calculated results agreed well with the experiment result. Then, the verified model was used to calculate the back sputtering deposition of bare chamber and the chamber with anti-sputtering target. The results showed that, the deposition rate of bare chamber case was 2.36×10-10g/(cm2•s), while the anti-sputtering target shield case was 2.51×10-11g/(cm2•s). It was clear that the back sputtering deposition yield with anti-sputtering target shield was an order of magnitude lower than the vacuum chamber without the anti-sputtering target.

AB - Considering very large error of current back sputtering model, a model of higher accuracy was proposed. A improved ion current density model was used to calculate the back sputtering deposition in the 80cm position deviating from the thruster while the Reynolds model had a big error. The calculated results agreed well with the experiment result. Then, the verified model was used to calculate the back sputtering deposition of bare chamber and the chamber with anti-sputtering target. The results showed that, the deposition rate of bare chamber case was 2.36×10-10g/(cm2•s), while the anti-sputtering target shield case was 2.51×10-11g/(cm2•s). It was clear that the back sputtering deposition yield with anti-sputtering target shield was an order of magnitude lower than the vacuum chamber without the anti-sputtering target.

KW - Anti-sputtering target

KW - Back sputtering deposition pollution

KW - Ion thruster

KW - Plume

KW - Quartz crystal microbalance

UR - https://www.scopus.com/pages/publications/85071015518

U2 - 10.13224/j.cnki.jasp.2019.05.024

DO - 10.13224/j.cnki.jasp.2019.05.024

M3 - 文章

AN - SCOPUS:85071015518

SN - 1000-8055

VL - 34

SP - 1178

EP - 1184

JO - Hangkong Dongli Xuebao/Journal of Aerospace Power

JF - Hangkong Dongli Xuebao/Journal of Aerospace Power

IS - 5

ER -

防溅射靶对离子推力器背溅射沉积污染的影响

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