Abstract
The relationship between the concentration of partially hydrolyzed polyacrylamide (HPAM) and the quantity of HPAM adsorbed on the SiO 2 surface was studied. The X-ray photoelectron spectroscopy(XPS) was used to investigate the interaction between the polymer molecules and the adsorbent surface. The experimental results show that the adsorption of HPAM on SiO 2 surface is consistent with Langmuir model. XPS analysis of the samples surface shows that the N/Si atomic concentration ratio reflects the quantity of HPAM adsorbed on the SiO 2 surface, and the increase of N 1, binding energy is related to the formation of the hydrogen-bonding between the HPAM molecules and the SiO2 surface.
| Original language | English |
|---|---|
| Pages (from-to) | x35-651 |
| Journal | Gaodeng Xuexiao Huaxue Xuebao/Chemical Journal of Chinese Universities |
| Volume | 18 |
| Issue number | 4 |
| State | Published - 1997 |
| Externally published | Yes |
Keywords
- HPAM
- SiO
- Static adsorption
- XPS
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