XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate

Li Liuhe; Xia Lifang; Ma Xinxin

doi:10.1016/S0257-8972(99)00426-0

XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate

Li Liuhe^*
, Xia Lifang
, Ma Xinxin

^*Corresponding author for this work

Harbin Institute of Technology

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C₂H₂ and a steady decrease of N₂ flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed.

Original language	English
Pages (from-to)	618-621
Number of pages	4
Journal	Surface and Coatings Technology
Volume	120-121
DOIs	https://doi.org/10.1016/S0257-8972(99)00426-0
State	Published - Nov 1999
Externally published	Yes

Keywords

Ti/TiN/Ti(N,C) multilayers
Vacuum arc deposition
XPS

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10.1016/S0257-8972(99)00426-0

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title = "XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate",

abstract = "Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C2H2 and a steady decrease of N2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed.",

keywords = "Ti/TiN/Ti(N,C) multilayers, Vacuum arc deposition, XPS",

author = "Li Liuhe and Xia Lifang and Ma Xinxin",

year = "1999",

month = nov,

doi = "10.1016/S0257-8972(99)00426-0",

language = "英语",

volume = "120-121",

pages = "618--621",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate

AU - Liuhe, Li

AU - Lifang, Xia

AU - Xinxin, Ma

PY - 1999/11

Y1 - 1999/11

N2 - Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C2H2 and a steady decrease of N2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed.

AB - Ti+TiN+Ti(N,C) films are deposited in a filtered vacuum arc deposition system by controlling the gas inlet order and gas flow rate, with a steady increase of C2H2 and a steady decrease of N2 flow rate. X-ray photoelectron spectroscopy (XPS) has been used to analysis the element depth profile. The C1s, N1s and Ti2p spectra are discussed.

KW - Ti/TiN/Ti(N,C) multilayers

KW - Vacuum arc deposition

KW - XPS

UR - https://www.scopus.com/pages/publications/0033502981

U2 - 10.1016/S0257-8972(99)00426-0

DO - 10.1016/S0257-8972(99)00426-0

M3 - 文章

AN - SCOPUS:0033502981

SN - 0257-8972

VL - 120-121

SP - 618

EP - 621

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

ER -

XPS of Ti+TiN+(N,C) multilayer films deposited by filtered cathodic arc deposition with controlled feed gas flow rate

Abstract

Keywords

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