Write operation study of Co/BTO/LSMO ferroelectric tunnel junction

Recently, a Co/BaTiO₃/La_0.67Sr_0.33MnO ₃ (Co/BTO/LSMO) ferroelectric tunnel junction (FTJ) has shown the great potential towards non-volatile memory and logic applications due to its excellent performance. Especially, the giant OFF/ON tunnel resistance ratio (e.g., ∼100) assures that FTJ-based random access memory (FTRAM) can achieve lower reading error rate than emerging magnetic RAM. Nevertheless, in this paper, our investigation demonstrated that this FTJ suffered from difficulties in write operation when integrating with current CMOS technology into a FTRAM. Specifically, the write performances of Co/BTO/LSMO 1T1R FTRAM such as cell area, speed, energy dissipation, and thermal fluctuation effect were simulated and evaluated with a compact model and CMOS 40 nm design kit. Simulation results indicate the drawbacks of this FTRAM including significant performance asymmetry between two write orientations, high write voltage, large cell area, and severe thermal fluctuation disturbance. Simultaneously, this research provides several methods of improving write performance of FTRAM from the perspective of device size and process parameters.