Variation-tolerant high-reliability sensing scheme for deep submicrometer STT-MRAM

Spin-transfer torque magnetic random access memory (STT-MRAM) has emerged as a promising candidate for the next-generation high-speed, low-power, and scalable nonvolatile memory technology. Its advantageous features have attracted much attention in the area of research and development, and a number of preindustrial prototypes and small-scale products have been demonstrated. One expects to widely commercialize it in the next few years. One of the critical issues that blocks STT-MRAM's wide commercialization is its low sensing reliability due to the relatively small tunnel magnetoresistance ratio of the magnetic tunnel junction (MTJ) and the continuously increasing process variations, especially as technology process scales down to the deep submicrometer nodes (e.g., 40 nm). In this paper, we present a variation-tolerant high-reliability sensing circuit for deep submicrometer STT-MRAM. This circuit, using triple-stage sensing and charge transfer amplification, is able to tolerate significantly the process variations and improve greatly the sensing margin by sacrificing some sensing time. Using a CMOS 40 nm design kit and a precise STT-MTJ compact model, transient and Monte Carlo simulations have been carried out to demonstrate its sensing performance.