TY - GEN
T1 - Uniform CoPt permanent magnetic film with high in-plane coercivity
AU - Li, Zhi
AU - Zhang, Kun
AU - Chen, Weibin
AU - Zhou, Zitong
AU - Cao, Zhiqiang
AU - Yan, Shaohua
AU - Zhao, Weisheng
AU - Leng, Qunwen
N1 - Publisher Copyright:
© 2021 IEEE.
PY - 2021/4/8
Y1 - 2021/4/8
N2 - Permanent magnetic CoPt films with different Pt component are fabricated by magnetron sputtering on W buffer layer at ambient temperature. The magnetic, composition, structural and surface properties of the films are systematically characterized. Ultra-low surface roughness Ra=0.311 nm and high in-plane coercivity Hc=2410 Oe are realized, which may exhibit promising application potential in the area of magnetic sensors.
AB - Permanent magnetic CoPt films with different Pt component are fabricated by magnetron sputtering on W buffer layer at ambient temperature. The magnetic, composition, structural and surface properties of the films are systematically characterized. Ultra-low surface roughness Ra=0.311 nm and high in-plane coercivity Hc=2410 Oe are realized, which may exhibit promising application potential in the area of magnetic sensors.
KW - CoPt film and Manufacturing
KW - Permanent magnetic film
UR - https://www.scopus.com/pages/publications/85106465562
U2 - 10.1109/EDTM50988.2021.9420813
DO - 10.1109/EDTM50988.2021.9420813
M3 - 会议稿件
AN - SCOPUS:85106465562
T3 - 2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021
BT - 2021 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 5th IEEE Electron Devices Technology and Manufacturing Conference, EDTM 2021
Y2 - 8 April 2021 through 11 April 2021
ER -