Skip to main navigation Skip to search Skip to main content

Ultrasensitive terahertz modulation by silicon-grown MoS2 nanosheets

  • Sai Chen
  • , Fei Fan*
  • , Yinping Miao
  • , Xiaotong He
  • , Kailiang Zhang
  • , Shengjiang Chang
  • *Corresponding author for this work
  • Nankai University
  • Cooperative Innovation Centre of Terahertz Science
  • Tianjin University of Technology
  • North China Research Institute of Electro-Optics

Research output: Contribution to journalArticlepeer-review

Abstract

Two-dimensional (2D) materials play more and more important roles these days, due to their broad applications in many areas. Herein, we propose an optically-pumped terahertz (THz) modulator, based on Si-grown MoS2 nanosheets. The broadband modulation effect has been proved by THz time domain spectroscopy and numerical simulation. The modulation depth of this Si-grown MoS2 nanosheet can reach over 75% under the low pumping power of 0.24 W cm-2, much deeper than that of bare silicon. By theoretical models and simulation, it is proved that the broadband modulation effect can be described as a free carrier absorption for THz waves in the Drude form. Importantly, by a catalyst mechanism in the Si-grown MoS2, it is concluded that the MoS2-Si heterostructure enables the MoS2 to catalyze more carriers generated on the Si surface. This novel 2D material has a high effective modulation on THz waves under a low pumping power density, which affords it a promising potential in THz applications.

Original languageEnglish
Pages (from-to)4713-4719
Number of pages7
JournalNanoscale
Volume8
Issue number8
DOIs
StatePublished - 28 Feb 2016
Externally publishedYes

Fingerprint

Dive into the research topics of 'Ultrasensitive terahertz modulation by silicon-grown MoS2 nanosheets'. Together they form a unique fingerprint.

Cite this