Abstract
Although Cu was studied extensively, the Hall-Petch relationship was mainly reported in the coarse-grained regime. In this work, fully recrystallized Cu specimens with a wide grain size regime of 0.51–14.93 μm manifest a two-stage Hall-Petch relationship. There is a critical grain size of 3 μm that divides stages I and II where the Hall-Petch slope k value are quite different. The stage II is supposed to be validified down to 100 nm at least by comparing with a Cu-Ag alloy. The critical grain size varies in different materials systems, and the underline mechanisms are discussed based on the dislocation glide modes.
| Original language | English |
|---|---|
| Pages (from-to) | 31-35 |
| Number of pages | 5 |
| Journal | Journal of Materials Science and Technology |
| Volume | 48 |
| DOIs | |
| State | Published - 1 Jul 2020 |
Keywords
- Cu
- Hall-Petch relationship
- Recrystallization
- Ultrafine grain
- Yield strength
Fingerprint
Dive into the research topics of 'Two-stage Hall-Petch relationship in Cu with recrystallized structure'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver