Abstract
Spin orbit torque (SOT) magnetic random access memory (MRAM) has been regarded as a promising solution to overcome the ‘memory wall’ problem and led the way to better computing. However, conventional top-pinned SOT-MRAMs with perpendicular magnetic anisotropy (PMA) always suffer from the sidewall redeposition and over-etching problem during fabrications, as well as lower tunneling magnetoresistance than the bottom-pinned one. To address these problems, we reported a novel SOT-MRAM with PMA and bottom-pinned magnetic reference layer, realizing SOT switching by current flowing through top SOT channel with assistance of in-plane magnetic field. Such device, known as top-SOT PMA-magnetic tunnel junction (pMTJ), presents critical switching current density around 40 MA/cm2 at 10 μs pulse width. In addition, we characterized the SOT efficiency directly in MRAM device and post-deposited top Pt electrode in top-SOT-pMTJ is demonstrated to be effective SOT source, inspiring flexible design of top-SOT-pMTJ stacks and fabrication process. The proposed structure with back-end-of-line compatible fabrication is anticipated to the mass production of high-performance SOT-MRAMs.
| Original language | English |
|---|---|
| Pages (from-to) | 1409-1412 |
| Number of pages | 4 |
| Journal | IEEE Electron Device Letters |
| Volume | 46 |
| Issue number | 8 |
| DOIs | |
| State | Published - 2025 |
Keywords
- Magnetic random access memory
- magnetic tunnel junction
- nano-microfabrication
- perpendicular magnetic anisotropy
- spin-orbit torque
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