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Theoretical study about the formation of the stacking faults in GaN nanowires along different growth directions

  • Xiaojing Gong*
  • , Jingping Zhang
  • , Ke Xu
  • , Zhigao Wang
  • , Hui Yang
  • , Rong Yu
  • , Wei Zhan
  • *Corresponding author for this work
  • CAS - Suzhou Institute of Nano-Tech and Nano-Bionics
  • Suzhou Nanowin Science and Technology Co., Ltd
  • University of Chinese Academy of Sciences
  • Tsinghua University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

Semiconducting nanowires offer the possibility of nearly unlimited complex bottom-up design, which allows for new device concepts. However, essential parameters that determine the electronic quality of the wires, and which have not been controlled yet for the III-V compound semiconductors, are the wire crystal structure and the stacking fault density. In this paper, we have used the molecular dynamics simulations to study the formation of the stacking faults in GaN NW along [0001] and [11-20] directions. The results show that under same growth condition the GaN NW along [0001] has stacking fault while there is no stacking fault in GaN NW along [11-20]. We have analysis the possible reason and further study is underway.

Original languageEnglish
Title of host publicationComputational Materials Science, CMS 2011
Pages950-954
Number of pages5
DOIs
StatePublished - 2011
Externally publishedYes
Event2011 International Conference on Computational Materials Science, CMS 2011 - Guangzhou, China
Duration: 17 Apr 201118 Apr 2011

Publication series

NameAdvanced Materials Research
Volume268-270
ISSN (Print)1022-6680

Conference

Conference2011 International Conference on Computational Materials Science, CMS 2011
Country/TerritoryChina
CityGuangzhou
Period17/04/1118/04/11

Keywords

  • Gallium nitride nanowire
  • Molecular dynamics simulations
  • Stacking faults

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