Skip to main navigation Skip to search Skip to main content

Tellurium-Assisted Low-Temperature Synthesis of MoS2 and WS2 Monolayers

  • Yongji Gong
  • , Zhong Lin
  • , Gonglan Ye
  • , Gang Shi
  • , Simin Feng
  • , Yu Lei
  • , Ana Laura Elías
  • , Nestor Perea-Lopez
  • , Robert Vajtai
  • , Humberto Terrones
  • , Zheng Liu
  • , Mauricio Terrones*
  • , Pulickel M. Ajayan
  • *Corresponding author for this work
  • Rice University
  • Pennsylvania State University
  • Rensselaer Polytechnic Institute
  • Nanyang Technological University

Research output: Contribution to journalArticlepeer-review

Abstract

Chemical vapor deposition (CVD) is a scalable method able to synthesize MoS2 and WS2 monolayers. In this work, we reduced the synthesis temperature by 200 °C only by introducing tellurium (Te) into the CVD process. The as-synthesized MoS2 and WS2 monolayers show high phase purity and crystallinity. The optical and electrical performance of these materials is comparable to those synthesized at higher temperatures. We believe this work will accelerate the industrial synthesis of these semiconducting monolayers.

Original languageEnglish
Pages (from-to)11658-11666
Number of pages9
JournalACS Nano
Volume9
Issue number12
DOIs
StatePublished - 26 Oct 2015
Externally publishedYes

Keywords

  • chemical vapor deposition
  • molybdenum disulfide
  • transition metal dichalcogenides
  • tungsten disulfide
  • two-dimensional materials

Fingerprint

Dive into the research topics of 'Tellurium-Assisted Low-Temperature Synthesis of MoS2 and WS2 Monolayers'. Together they form a unique fingerprint.

Cite this