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System of measuring micrographs with high accuracy

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A new kind of analytics method based on laser heterodyne interferometer to achieve high lateral resolution is presented. This system needs no special platform and the size of the laser beam is several micron. The Gaussian distribution theory and the phase sum theory of laser beam are used to set up mathematics model for measuring the edge of micrograph. Modern multivariable regression techniques are applied to estimate the edge position of step. The estimation accuracy of this method is only related to measurement accuracy of measured variable. The lateral positioning accuracy of this system can reach the order of 0.1μm. On the other hand, the errors caused by the frequency mixing of the laser beam of the common-path optical system are also analyzed. The calculated curves of the errors are given and the method to reduce these phase errors is also introduced.

Original languageEnglish
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsFrederick Y. Wu, Shenghua Ye
Pages281-287
Number of pages7
StatePublished - 1996
EventAutomated Optical Inspection for Industry - Beijing, China
Duration: 6 Nov 19967 Nov 1996

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Volume2899
ISSN (Print)0277-786X

Conference

ConferenceAutomated Optical Inspection for Industry
CityBeijing, China
Period6/11/967/11/96

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