Skip to main navigation Skip to search Skip to main content

Synthesis of large-scale atomic-layer SnS2 through chemical vapor deposition

  • Gonglan Ye
  • , Yongji Gong
  • , Sidong Lei
  • , Yongmin He
  • , Bo Li
  • , Xiang Zhang
  • , Zehua Jin
  • , Liangliang Dong
  • , Jun Lou
  • , Robert Vajtai
  • , Wu Zhou
  • , Pulickel M. Ajayan*
  • *Corresponding author for this work
  • Rice University
  • Oak Ridge National Laboratory

Research output: Contribution to journalArticlepeer-review

Abstract

Two-dimensional layers of metal dichalcogenides have attracted much attention because of their ultrathin thickness and potential applications in electronics and optoelectronics. Monolayer SnS2, with a band gap of ~2.6 eV, has an octahedral lattice made of two atomic layers of sulfur and one atomic layer of tin. Till date, there have been limited reports on the growth of large-scale and high quality SnS2 atomic layers and the investigation of their properties as a semiconductor. Here, we report the chemical vapor deposition (CVD) growth of atomic-layer SnS2 with a large crystal size and uniformity. In addition, the number of layers can be changed from a monolayer to few layers and to bulk by changing the growth time. Scanning transmission electron microscopy was used to analyze the atomic structure and demonstrate the 2H stacking poly-type of different layers. The resultant SnS2 crystals is used as a photodetector with external quantum efficiency as high as 150%, suggesting promise for optoelectronic applications. [Figure not available: see fulltext.].

Original languageEnglish
Pages (from-to)2386-2394
Number of pages9
JournalNano Research
Volume10
Issue number7
DOIs
StatePublished - 1 Jul 2017

Keywords

  • chemical vapor deposition
  • metal dichalcogenides
  • photodetector
  • tin disulfide
  • two-dimensional materials

Fingerprint

Dive into the research topics of 'Synthesis of large-scale atomic-layer SnS2 through chemical vapor deposition'. Together they form a unique fingerprint.

Cite this