Synthesis and optical properties of three-dimensional nanowall ZnO film prepared by atmospheric pressure chemical vapor deposition

Zhenjun Li; Zuofu Hu; Li Jiang; Haiqin Huang; Fengjuan Liu; Xiqing Zhang; Yongsheng Wang; Penggang Yin; Lin Guo

doi:10.1016/j.apsusc.2012.06.101

Synthesis and optical properties of three-dimensional nanowall ZnO film prepared by atmospheric pressure chemical vapor deposition

Zhenjun Li
, Zuofu Hu
, Li Jiang
, Haiqin Huang
, Fengjuan Liu
, Xiqing Zhang^*
, Yongsheng Wang
, Penggang Yin
, Lin Guo

^*Corresponding author for this work

Beijing Jiaotong University
University of Aeronautics and Astronautics

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

Without template, three-dimensional nanowall ZnO films were synthesized in an atmospheric pressure chemical vapor deposition (APCVD) system by adjusting zinc species concentration. In the high ordered film, the vertical nanosheets were assembled along three directions angled approximately 120°. The extremely strong ZnO (0 0 0 2) peaks in X-ray diffraction patterns testified the preferred (0 0 0 1) orientation and high crystalline quality of the films. The low transmittances of nanowall films were attributed to the strong inner reflection and scattering. These results show that the simplified APCVD method is potential in synthesizing uniform nanowall ZnO films.

Original language	English
Pages (from-to)	10175-10179
Number of pages	5
Journal	Applied Surface Science
Volume	258
Issue number	24
DOIs	https://doi.org/10.1016/j.apsusc.2012.06.101
State	Published - 1 Oct 2012
Externally published	Yes

Keywords

Chemical vapor deposition
Nanowall film
Optical property
Zinc oxide

Access to Document

10.1016/j.apsusc.2012.06.101

Cite this

@article{3e7fdf16278c4eb4a754649e407ef580,

title = "Synthesis and optical properties of three-dimensional nanowall ZnO film prepared by atmospheric pressure chemical vapor deposition",

abstract = "Without template, three-dimensional nanowall ZnO films were synthesized in an atmospheric pressure chemical vapor deposition (APCVD) system by adjusting zinc species concentration. In the high ordered film, the vertical nanosheets were assembled along three directions angled approximately 120°. The extremely strong ZnO (0 0 0 2) peaks in X-ray diffraction patterns testified the preferred (0 0 0 1) orientation and high crystalline quality of the films. The low transmittances of nanowall films were attributed to the strong inner reflection and scattering. These results show that the simplified APCVD method is potential in synthesizing uniform nanowall ZnO films.",

keywords = "Chemical vapor deposition, Nanowall film, Optical property, Zinc oxide",

author = "Zhenjun Li and Zuofu Hu and Li Jiang and Haiqin Huang and Fengjuan Liu and Xiqing Zhang and Yongsheng Wang and Penggang Yin and Lin Guo",

year = "2012",

month = oct,

day = "1",

doi = "10.1016/j.apsusc.2012.06.101",

language = "英语",

volume = "258",

pages = "10175--10179",

journal = "Applied Surface Science",

issn = "0169-4332",

publisher = "Elsevier B.V.",

number = "24",

}

TY - JOUR

T1 - Synthesis and optical properties of three-dimensional nanowall ZnO film prepared by atmospheric pressure chemical vapor deposition

AU - Li, Zhenjun

AU - Hu, Zuofu

AU - Jiang, Li

AU - Huang, Haiqin

AU - Liu, Fengjuan

AU - Zhang, Xiqing

AU - Wang, Yongsheng

AU - Yin, Penggang

AU - Guo, Lin

PY - 2012/10/1

Y1 - 2012/10/1

N2 - Without template, three-dimensional nanowall ZnO films were synthesized in an atmospheric pressure chemical vapor deposition (APCVD) system by adjusting zinc species concentration. In the high ordered film, the vertical nanosheets were assembled along three directions angled approximately 120°. The extremely strong ZnO (0 0 0 2) peaks in X-ray diffraction patterns testified the preferred (0 0 0 1) orientation and high crystalline quality of the films. The low transmittances of nanowall films were attributed to the strong inner reflection and scattering. These results show that the simplified APCVD method is potential in synthesizing uniform nanowall ZnO films.

AB - Without template, three-dimensional nanowall ZnO films were synthesized in an atmospheric pressure chemical vapor deposition (APCVD) system by adjusting zinc species concentration. In the high ordered film, the vertical nanosheets were assembled along three directions angled approximately 120°. The extremely strong ZnO (0 0 0 2) peaks in X-ray diffraction patterns testified the preferred (0 0 0 1) orientation and high crystalline quality of the films. The low transmittances of nanowall films were attributed to the strong inner reflection and scattering. These results show that the simplified APCVD method is potential in synthesizing uniform nanowall ZnO films.

KW - Chemical vapor deposition

KW - Nanowall film

KW - Optical property

KW - Zinc oxide

UR - https://www.scopus.com/pages/publications/84864720300

U2 - 10.1016/j.apsusc.2012.06.101

DO - 10.1016/j.apsusc.2012.06.101

M3 - 文章

AN - SCOPUS:84864720300

SN - 0169-4332

VL - 258

SP - 10175

EP - 10179

JO - Applied Surface Science

JF - Applied Surface Science

IS - 24

ER -

Synthesis and optical properties of three-dimensional nanowall ZnO film prepared by atmospheric pressure chemical vapor deposition

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this