Surface properties and microstructure of implanted TiN films using MEVVA ion source

J. H. Yang; M. F. Cheng; X. D. Luo; T. H. Zhang

doi:10.1016/j.msea.2006.09.073

Surface properties and microstructure of implanted TiN films using MEVVA ion source

J. H. Yang^*
, M. F. Cheng
, X. D. Luo
, T. H. Zhang

^*Corresponding author for this work

Nantong University
Beijing Normal University

Research output: Contribution to journal › Article › peer-review

26 Scopus citations

Abstract

The PVD-TiN film was implanted with titanium and nitrogen ions and the improvement in surface wear resistance was investigated. Ti ion implantation was done using a metal vapor vacuum arc (MEVVA) ion source with an implantation dose of 2 × 10¹⁶ ions/cm² and at an extraction voltage of 48 kV. The wear characteristics of the implanted samples were measured and compared with the performance of the unimplanted one by a pin-on-disc apparatus and an optical interference microscope. The structures of the samples were observed by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). A dynamic TRIM called as TRIDYN was used to calculate the concentration depth profiles of implanted ions in TiN to investigate wear resistance mechanisms. The results showed that the improved wear resistance of the TiN film was mainly due to forming of nano-order TiN crystal grains in a thick amorphous layer and the decreased local state number of Ti after Ti ion implantation.

Original language	English
Pages (from-to)	558-562
Number of pages	5
Journal	Materials Science and Engineering: A
Volume	445-446
DOIs	https://doi.org/10.1016/j.msea.2006.09.073
State	Published - 15 Feb 2007
Externally published	Yes

Keywords

Ion implantation
TEM
TRIDYN
TiN
Wear resistance
XPS

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10.1016/j.msea.2006.09.073

Cite this

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title = "Surface properties and microstructure of implanted TiN films using MEVVA ion source",

abstract = "The PVD-TiN film was implanted with titanium and nitrogen ions and the improvement in surface wear resistance was investigated. Ti ion implantation was done using a metal vapor vacuum arc (MEVVA) ion source with an implantation dose of 2 {\texttimes} 1016 ions/cm2 and at an extraction voltage of 48 kV. The wear characteristics of the implanted samples were measured and compared with the performance of the unimplanted one by a pin-on-disc apparatus and an optical interference microscope. The structures of the samples were observed by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). A dynamic TRIM called as TRIDYN was used to calculate the concentration depth profiles of implanted ions in TiN to investigate wear resistance mechanisms. The results showed that the improved wear resistance of the TiN film was mainly due to forming of nano-order TiN crystal grains in a thick amorphous layer and the decreased local state number of Ti after Ti ion implantation.",

keywords = "Ion implantation, TEM, TRIDYN, TiN, Wear resistance, XPS",

author = "Yang, \{J. H.\} and Cheng, \{M. F.\} and Luo, \{X. D.\} and Zhang, \{T. H.\}",

year = "2007",

month = feb,

day = "15",

doi = "10.1016/j.msea.2006.09.073",

language = "英语",

volume = "445-446",

pages = "558--562",

journal = "Materials Science and Engineering: A",

issn = "0921-5093",

publisher = "Elsevier Ltd",

}

TY - JOUR

T1 - Surface properties and microstructure of implanted TiN films using MEVVA ion source

AU - Yang, J. H.

AU - Cheng, M. F.

AU - Luo, X. D.

AU - Zhang, T. H.

PY - 2007/2/15

Y1 - 2007/2/15

N2 - The PVD-TiN film was implanted with titanium and nitrogen ions and the improvement in surface wear resistance was investigated. Ti ion implantation was done using a metal vapor vacuum arc (MEVVA) ion source with an implantation dose of 2 × 1016 ions/cm2 and at an extraction voltage of 48 kV. The wear characteristics of the implanted samples were measured and compared with the performance of the unimplanted one by a pin-on-disc apparatus and an optical interference microscope. The structures of the samples were observed by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). A dynamic TRIM called as TRIDYN was used to calculate the concentration depth profiles of implanted ions in TiN to investigate wear resistance mechanisms. The results showed that the improved wear resistance of the TiN film was mainly due to forming of nano-order TiN crystal grains in a thick amorphous layer and the decreased local state number of Ti after Ti ion implantation.

AB - The PVD-TiN film was implanted with titanium and nitrogen ions and the improvement in surface wear resistance was investigated. Ti ion implantation was done using a metal vapor vacuum arc (MEVVA) ion source with an implantation dose of 2 × 1016 ions/cm2 and at an extraction voltage of 48 kV. The wear characteristics of the implanted samples were measured and compared with the performance of the unimplanted one by a pin-on-disc apparatus and an optical interference microscope. The structures of the samples were observed by X-ray photoelectron spectroscopy (XPS) and transmission electron microscopy (TEM). A dynamic TRIM called as TRIDYN was used to calculate the concentration depth profiles of implanted ions in TiN to investigate wear resistance mechanisms. The results showed that the improved wear resistance of the TiN film was mainly due to forming of nano-order TiN crystal grains in a thick amorphous layer and the decreased local state number of Ti after Ti ion implantation.

KW - Ion implantation

KW - TEM

KW - TRIDYN

KW - TiN

KW - Wear resistance

KW - XPS

UR - https://www.scopus.com/pages/publications/33845900461

U2 - 10.1016/j.msea.2006.09.073

DO - 10.1016/j.msea.2006.09.073

M3 - 文章

AN - SCOPUS:33845900461

SN - 0921-5093

VL - 445-446

SP - 558

EP - 562

JO - Materials Science and Engineering: A

JF - Materials Science and Engineering: A

ER -

Surface properties and microstructure of implanted TiN films using MEVVA ion source

Abstract

Keywords

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