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Study of intense pulsed ion beam mixing with RBS

  • Sha Yan*
  • , Xiaoyun Le
  • , Weijiang Zhao
  • , Yugang Wang
  • , Jianming Xue
  • *Corresponding author for this work
  • Peking University

Research output: Contribution to journalArticlepeer-review

Abstract

The mixing effect of three different film/substrate systems, Ti/Al, Al/Ti and Ni/Ti, which were irradiated by intense pulsed ion beam, was studied with Rutherford backscattering spectroscopy (RBS). It was found that a quite well mixed layer with gradient components was formed in Ni/Ti combination. The thickness of the mixing layer is far beyond the ion range. They were mixed probably in molten state. It was also found that the mixing degree strongly related to the difference of the melting points of film/substrate couple, as well as the difference of the surface tensions.

Original languageEnglish
Pages (from-to)125-128
Number of pages4
JournalHe Jishu/Nuclear Techniques
Volume29
Issue number2
StatePublished - Feb 2006

Keywords

  • Intense pulsed ion beam
  • Ion beam mixing
  • Rutherford backscattering spectroscopy

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