Structure and properties of zirconia (ZrO₂) films fabricated by plasma-assisted cathodic arc deposition

Zirconia (ZrO₂) thin films were prepared on Si (1 0 0) substrates by plasma-assisted cathodic arc deposition under different processing conditions. The structure and phase composition of the zirconia films were investigated by x-ray diffraction, x-ray photoelectron spectroscopy, and atomic force microscopy. Their properties, including the ability to induce the formation of apatite on the surface in a simulated body fluid, and dielectric characteristics were studied. The tetragonal phase predominates in the ZrO ₂ film and its surface microstructures are strongly dependent on the processing conditions such as substrate temperature and bias applied during plasma-assisted deposition. The influence of the deposition parameters on the microstructures and properties of the ZrO₂ films was systematically investigated and our results indicate that the desired attributes and performance of the ZrO₂ films can be achieved by optimization of the plasma and deposition processing parameters. Our results provide further insight into producing films of the required quality using plasma-assisted cathodic arc deposition.