Structural and physical properties of Mg-doped CuAlO2 thin films

Guobo Dong; Ming Zhang; Wei Lan; Peiming Dong; Hui Yan

doi:10.1016/j.vacuum.2008.04.010

Structural and physical properties of Mg-doped CuAlO₂ thin films

Guobo Dong
, Ming Zhang^*
, Wei Lan
, Peiming Dong
, Hui Yan

^*Corresponding author for this work

Beijing University of Technology
Lanzhou University

Research output: Contribution to journal › Article › peer-review

60 Scopus citations

Abstract

The CuAl_1-xMg_xO₂ (x = 0, 0.01, 0.02 and 0.05) thin films were successfully deposited on quartz substrate by using the RF magnetron sputtering technique. XRD patterns indicate that the delafossite structure could be guaranteed for all CuAl_1-xMg_xO₂ films. The conductivity measured at room temperature for CuAl_0.98Mg_0.02O₂ film is three orders of magnitude higher than that of undoped CuAlO₂ film and the band gaps of CuAl_1-xMg_xO₂ (x = 0, 0.01, 0.02 and 0.05) thin films decrease with the increase of the doping concentration, which is related to the formation of impurity energy levels with increasing the doping concentration.

Original language	English
Pages (from-to)	1321-1324
Number of pages	4
Journal	Vacuum
Volume	82
Issue number	11
DOIs	https://doi.org/10.1016/j.vacuum.2008.04.010
State	Published - 19 Jun 2008
Externally published	Yes

Keywords

Band gap
Conductivity
CuAlO films
Doping concentrations

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10.1016/j.vacuum.2008.04.010

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title = "Structural and physical properties of Mg-doped CuAlO2 thin films",

abstract = "The CuAl1-xMgxO2 (x = 0, 0.01, 0.02 and 0.05) thin films were successfully deposited on quartz substrate by using the RF magnetron sputtering technique. XRD patterns indicate that the delafossite structure could be guaranteed for all CuAl1-xMgxO2 films. The conductivity measured at room temperature for CuAl0.98Mg0.02O2 film is three orders of magnitude higher than that of undoped CuAlO2 film and the band gaps of CuAl1-xMgxO2 (x = 0, 0.01, 0.02 and 0.05) thin films decrease with the increase of the doping concentration, which is related to the formation of impurity energy levels with increasing the doping concentration.",

keywords = "Band gap, Conductivity, CuAlO films, Doping concentrations",

author = "Guobo Dong and Ming Zhang and Wei Lan and Peiming Dong and Hui Yan",

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doi = "10.1016/j.vacuum.2008.04.010",

language = "英语",

volume = "82",

pages = "1321--1324",

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issn = "0042-207X",

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TY - JOUR

T1 - Structural and physical properties of Mg-doped CuAlO2 thin films

AU - Dong, Guobo

AU - Zhang, Ming

AU - Lan, Wei

AU - Dong, Peiming

AU - Yan, Hui

PY - 2008/6/19

Y1 - 2008/6/19

N2 - The CuAl1-xMgxO2 (x = 0, 0.01, 0.02 and 0.05) thin films were successfully deposited on quartz substrate by using the RF magnetron sputtering technique. XRD patterns indicate that the delafossite structure could be guaranteed for all CuAl1-xMgxO2 films. The conductivity measured at room temperature for CuAl0.98Mg0.02O2 film is three orders of magnitude higher than that of undoped CuAlO2 film and the band gaps of CuAl1-xMgxO2 (x = 0, 0.01, 0.02 and 0.05) thin films decrease with the increase of the doping concentration, which is related to the formation of impurity energy levels with increasing the doping concentration.

AB - The CuAl1-xMgxO2 (x = 0, 0.01, 0.02 and 0.05) thin films were successfully deposited on quartz substrate by using the RF magnetron sputtering technique. XRD patterns indicate that the delafossite structure could be guaranteed for all CuAl1-xMgxO2 films. The conductivity measured at room temperature for CuAl0.98Mg0.02O2 film is three orders of magnitude higher than that of undoped CuAlO2 film and the band gaps of CuAl1-xMgxO2 (x = 0, 0.01, 0.02 and 0.05) thin films decrease with the increase of the doping concentration, which is related to the formation of impurity energy levels with increasing the doping concentration.

KW - Band gap

KW - Conductivity

KW - CuAlO films

KW - Doping concentrations

UR - https://www.scopus.com/pages/publications/46549086534

U2 - 10.1016/j.vacuum.2008.04.010

DO - 10.1016/j.vacuum.2008.04.010

M3 - 文章

AN - SCOPUS:46549086534

SN - 0042-207X

VL - 82

SP - 1321

EP - 1324

JO - Vacuum

JF - Vacuum

IS - 11

ER -

Structural and physical properties of Mg-doped CuAlO₂ thin films

Abstract

Keywords

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