Skip to main navigation Skip to search Skip to main content

Strong enhancement of ultra-violet emission by CE doping of ZnO sputtered films

  • C. L. Heng
  • , T. Wang
  • , H. Li
  • , J. J. Liu
  • , J. W. Zhu
  • , A. Ablimit
  • , W. Y. Su
  • , H. C. Wu
  • , P. G. Yin
  • , T. G. Finstad*
  • *Corresponding author for this work
  • Beijing Institute of Technology
  • University of Oslo

Research output: Contribution to journal › Article › peer-review

Abstract

We report that ultra-violet (UV) emission of ZnO can be made much more intense by incorporating Ce in the ZnO films. After annealing at 1100 °C in N2 gas, the UV peak (≈3.34 eV, width 133 meV) - intensity for the film doped with Ce is two order of magnitude stronger than that of un-doped ZnO films. The large enhancement is correlated with improved crystallinity and appears due to fewer non-radiative recombination pathways. The improved crystallinity can be related to Ce affecting the self-texturing of ZnO during sputter deposition and annealing.

Original languageEnglish
Pages (from-to)53-55
Number of pages3
JournalMaterials Letters
Volume162
DOIs
StatePublished - 1 Jan 2016

Keywords

  • Ce
  • Texture
  • Thin film
  • UV Luminescence
  • ZnO

Fingerprint

Dive into the research topics of 'Strong enhancement of ultra-violet emission by CE doping of ZnO sputtered films'. Together they form a unique fingerprint.

Cite this