Simulation and optimization of magnetic field for planar magnetron sputtering target

A novel design of the magnetic field for the planar magnetron sputtering target was developed to improve the target utilization and uniformity by optimizing the horizontal component of the magnetic flux density on the surface of the target. The newly-developed target modified the conventional target with the two ferromagnetic shunt shims (FSS). The impacts of the geometry and location of the two FSS on the horizontal magnetic flux density distribution on the target surface were simulated with software package ANSYS. The simulated results show that the thickness of the two FSS and its distance from the permanent magnet effectively improve the uniformity of the horizontal magnetic flux density distribution and utility efficiency of the target. Besides, the influence of the cross-sectional magnetic field distribution at different distances from the target surface on the sputtered target profile was also simulated.