Selective area epitaxial growth of InP nanowire array for solar cell applications

  • Q. Gao
  • , L. Fu
  • , F. Wang
  • , Y. Guo
  • , Z. Y. Li
  • , K. Peng
  • , Li Li
  • , Z. Li
  • , Y. Wenas
  • , S. Mokkapati
  • , H. H. Tan
  • , C. Jagadish

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

InP nanowire arrays have been grown and optimized using selective area epitaxy by metalorganic chemical vapour deposition technique. High quality stacking fault free wurtzite nanowires with a wide range of diameters and room temperature minority carrier lifetime as high as ∼ 1.6 ns have been obtained. An axially doped n-i-p structure was further grown and successfully fabricated into solar cell devices. The photovoltaic behaviors of the device have been investigated and compared to simulation results.

Original languageEnglish
Title of host publication2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014
EditorsMariusz Martyniuk, Lorenzo Faraone
PublisherInstitute of Electrical and Electronics Engineers Inc.
Pages252-253
Number of pages2
ISBN (Electronic)9781479968671
DOIs
StatePublished - 10 Feb 2014
Externally publishedYes
Event2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014 - Perth, Australia
Duration: 14 Dec 201417 Dec 2014

Publication series

Name2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014

Conference

Conference2014 Conference on Optoelectronic and Microelectronic Materials and Devices, COMMAD 2014
Country/TerritoryAustralia
CityPerth
Period14/12/1417/12/14

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

  1. SDG 7 - Affordable and Clean Energy
    SDG 7 Affordable and Clean Energy

Keywords

  • MOCVD
  • nanowire
  • selective area epitaxy
  • solar cell

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