Scanning electrochemical microscopy study on the electrochemical behavior of CrN film formed on 304 stainless steel by magnetron sputtering

Shujun Gao; Chaofang Dong; Hong Luo; Kui Xiao; Xiaoming Pan; Xiaogang Li

doi:10.1016/j.electacta.2013.10.009

Scanning electrochemical microscopy study on the electrochemical behavior of CrN film formed on 304 stainless steel by magnetron sputtering

Shujun Gao
, Chaofang Dong^*
, Hong Luo
, Kui Xiao
, Xiaoming Pan
, Xiaogang Li

^*Corresponding author for this work

University of Science and Technology Beijing
Hohai University

Research output: Contribution to journal › Article › peer-review

66 Scopus citations

Abstract

The electrochemical behavior of CrN film formed on 304 stainless steel (304 SS) by magnetron sputtering was investigated by scanning electrochemical microscopy (SECM) in redox competition mode and X-ray photoelectron spectroscopy (XPS) in 0.2 M H₃BO₃ + 0.05 M Na₂B ₄O₇ (pH = 8.4) buffer solution containing 3.5 wt% NaCl. The results demonstrated that passive film could form on the surface of CrN film with the chemical compositions of Cr, Cr₂O₃, CrN, Cr(OH)₃, and CrO₃. When applied with 0.9 vs SCE/V potential, the pitting propagation sites corresponded to the high oxygen consumption region. While above stable pit, the Pt microelectrode showed an enhanced faradic current. Separated anodes and cathodes were observed in the scratch, which suggested that the dominant corrosion mechanism is pitting corrosion induced and promoted by galvanic corrosion. These results provide a more explicit description of the corrosion mechanism and processes of CrN film.

Original language	English
Pages (from-to)	233-241
Number of pages	9
Journal	Electrochimica Acta
Volume	114
DOIs	https://doi.org/10.1016/j.electacta.2013.10.009
State	Published - 2013
Externally published	Yes

Keywords

CrN
Electrochemical behavior
Redox competition mode
SECM

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10.1016/j.electacta.2013.10.009

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@article{e3e521990b2a45538482d2873b2cd366,

title = "Scanning electrochemical microscopy study on the electrochemical behavior of CrN film formed on 304 stainless steel by magnetron sputtering",

abstract = "The electrochemical behavior of CrN film formed on 304 stainless steel (304 SS) by magnetron sputtering was investigated by scanning electrochemical microscopy (SECM) in redox competition mode and X-ray photoelectron spectroscopy (XPS) in 0.2 M H3BO3 + 0.05 M Na2B 4O7 (pH = 8.4) buffer solution containing 3.5 wt\% NaCl. The results demonstrated that passive film could form on the surface of CrN film with the chemical compositions of Cr, Cr2O3, CrN, Cr(OH)3, and CrO3. When applied with 0.9 vs SCE/V potential, the pitting propagation sites corresponded to the high oxygen consumption region. While above stable pit, the Pt microelectrode showed an enhanced faradic current. Separated anodes and cathodes were observed in the scratch, which suggested that the dominant corrosion mechanism is pitting corrosion induced and promoted by galvanic corrosion. These results provide a more explicit description of the corrosion mechanism and processes of CrN film.",

keywords = "CrN, Electrochemical behavior, Redox competition mode, SECM",

author = "Shujun Gao and Chaofang Dong and Hong Luo and Kui Xiao and Xiaoming Pan and Xiaogang Li",

year = "2013",

doi = "10.1016/j.electacta.2013.10.009",

language = "英语",

volume = "114",

pages = "233--241",

journal = "Electrochimica Acta",

issn = "0013-4686",

publisher = "Elsevier Ltd",

}

TY - JOUR

T1 - Scanning electrochemical microscopy study on the electrochemical behavior of CrN film formed on 304 stainless steel by magnetron sputtering

AU - Gao, Shujun

AU - Dong, Chaofang

AU - Luo, Hong

AU - Xiao, Kui

AU - Pan, Xiaoming

AU - Li, Xiaogang

PY - 2013

Y1 - 2013

N2 - The electrochemical behavior of CrN film formed on 304 stainless steel (304 SS) by magnetron sputtering was investigated by scanning electrochemical microscopy (SECM) in redox competition mode and X-ray photoelectron spectroscopy (XPS) in 0.2 M H3BO3 + 0.05 M Na2B 4O7 (pH = 8.4) buffer solution containing 3.5 wt% NaCl. The results demonstrated that passive film could form on the surface of CrN film with the chemical compositions of Cr, Cr2O3, CrN, Cr(OH)3, and CrO3. When applied with 0.9 vs SCE/V potential, the pitting propagation sites corresponded to the high oxygen consumption region. While above stable pit, the Pt microelectrode showed an enhanced faradic current. Separated anodes and cathodes were observed in the scratch, which suggested that the dominant corrosion mechanism is pitting corrosion induced and promoted by galvanic corrosion. These results provide a more explicit description of the corrosion mechanism and processes of CrN film.

AB - The electrochemical behavior of CrN film formed on 304 stainless steel (304 SS) by magnetron sputtering was investigated by scanning electrochemical microscopy (SECM) in redox competition mode and X-ray photoelectron spectroscopy (XPS) in 0.2 M H3BO3 + 0.05 M Na2B 4O7 (pH = 8.4) buffer solution containing 3.5 wt% NaCl. The results demonstrated that passive film could form on the surface of CrN film with the chemical compositions of Cr, Cr2O3, CrN, Cr(OH)3, and CrO3. When applied with 0.9 vs SCE/V potential, the pitting propagation sites corresponded to the high oxygen consumption region. While above stable pit, the Pt microelectrode showed an enhanced faradic current. Separated anodes and cathodes were observed in the scratch, which suggested that the dominant corrosion mechanism is pitting corrosion induced and promoted by galvanic corrosion. These results provide a more explicit description of the corrosion mechanism and processes of CrN film.

KW - CrN

KW - Electrochemical behavior

KW - Redox competition mode

KW - SECM

UR - https://www.scopus.com/pages/publications/84887057736

U2 - 10.1016/j.electacta.2013.10.009

DO - 10.1016/j.electacta.2013.10.009

M3 - 文章

AN - SCOPUS:84887057736

SN - 0013-4686

VL - 114

SP - 233

EP - 241

JO - Electrochimica Acta

JF - Electrochimica Acta

ER -

Scanning electrochemical microscopy study on the electrochemical behavior of CrN film formed on 304 stainless steel by magnetron sputtering

Abstract

Keywords

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