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Recent progress in patterned silicon nanowire arrays: Fabrication, properties and applications

  • Yan Zhang
  • , Teng Qiu*
  • , Wenjun Zhang
  • , Paul K. Chu
  • *Corresponding author for this work
  • Southeast University, Nanjing
  • City University of Hong Kong

Research output: Contribution to journalArticlepeer-review

Abstract

Currently there is great interest in patterned silicon nanowire arrays and applications. The accurately controlled fabrication of patterned silicon nanowire arrays with the desirable axial crystallographic orientation using simpler and quicker ways is very desirable and of great importance to material synthesis and future nanoscale optoelectronic devices that employ silicon. The recent advances in manipulating patterned silicon nanowire arrays and patents are reviewed with a focus on the progress of nanowire fabrication and applications.

Original languageEnglish
Pages (from-to)62-70
Number of pages9
JournalRecent Patents on Nanotechnology
Volume5
Issue number1
DOIs
StatePublished - 2011
Externally publishedYes

Keywords

  • Chemical vapor deposition
  • Field-effect transistor
  • Molecular beam epitaxy
  • Patterned silicon nanowire arrays
  • Selfselective electroless plating
  • Si solar cells
  • Thermal conductivity
  • Thermal evaporation

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