Abstract
The preparation of high-resolution micro-patterns is urgently demanded for developing opto-/electric-devices in various applications. Generally, solution processes have been commonly used for fabricating micro-patterned surfaces for its mild operation conditions, facile operability and low-cost. In this contribution, we reviewed recent processes on preparing micro-/nano-patterns using solution processes based the viewpoint of resolution, including inkjet printing, photolithography, micro-contact printing, dip-pen nanolithography, and fiber direct writing, etc. Specifically, advantages/disadvantages and development prospects of various solution processes for preparing micro-/nano-patterns are also summarized. We envision that the review will provide inspirations for developing and optimizing various high-resolution micro-/nano-patterns using solution processes.
| Original language | English |
|---|---|
| Pages (from-to) | 1008-1018 |
| Number of pages | 11 |
| Journal | Chemical Research in Chinese Universities |
| Volume | 37 |
| Issue number | 5 |
| DOIs | |
| State | Published - Oct 2021 |
Keywords
- High resolution
- Micro-pattern
- Solution processe
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