Preparation of nano-microcrystalline NiOx films by magnetron sputtering and cooling substrates

Huai Yi Wang; Xun Gang Diao; Wu Yu Wang; Hai Gang Yang; Peng Ding; Wei Chang Hao; Tian Min Wang

Preparation of nano-microcrystalline NiO_x films by magnetron sputtering and cooling substrates

Huai Yi Wang^*
, Xun Gang Diao
, Wu Yu Wang
, Hai Gang Yang
, Peng Ding
, Wei Chang Hao
, Tian Min Wang

^*Corresponding author for this work

Beihang University
Beijing Institute of Graphic Communication
General Research Institute for Non-ferrous Metals China

Research output: Contribution to journal › Article › peer-review

Abstract

In this paper, it is introduced that using a cooling apparatus based on liquid nitrogen, we have prepared NiO_x films with nano-microcrystalline structure by reactive magnetron sputtering. X-ray diffiration (XRD) and Images of scanning electron microscope (SEM) demonstrate that when we employ equal sputtering parameters, using this method, we can effectively regulate or control grain size of NiO_x films with nano-microcrystalline structure.

Original language	English
Pages (from-to)	1618-1621
Number of pages	4
Journal	Gongneng Cailiao/Journal of Functional Materials
Volume	39
Issue number	10
State	Published - Oct 2008

Keywords

Magnetron sputtering
Nano-microcrystalline structure
NiO films

Cite this

@article{12b1380c7208439fac09bb286e6ff552,

title = "Preparation of nano-microcrystalline NiOx films by magnetron sputtering and cooling substrates",

abstract = "In this paper, it is introduced that using a cooling apparatus based on liquid nitrogen, we have prepared NiOx films with nano-microcrystalline structure by reactive magnetron sputtering. X-ray diffiration (XRD) and Images of scanning electron microscope (SEM) demonstrate that when we employ equal sputtering parameters, using this method, we can effectively regulate or control grain size of NiOx films with nano-microcrystalline structure.",

keywords = "Magnetron sputtering, Nano-microcrystalline structure, NiO films",

author = "Wang, \{Huai Yi\} and Diao, \{Xun Gang\} and Wang, \{Wu Yu\} and Yang, \{Hai Gang\} and Peng Ding and Hao, \{Wei Chang\} and Wang, \{Tian Min\}",

year = "2008",

month = oct,

language = "英语",

volume = "39",

pages = "1618--1621",

journal = "Gongneng Cailiao/Journal of Functional Materials",

issn = "1001-9731",

publisher = "Journal of Functional Materials",

number = "10",

}

TY - JOUR

T1 - Preparation of nano-microcrystalline NiOx films by magnetron sputtering and cooling substrates

AU - Wang, Huai Yi

AU - Diao, Xun Gang

AU - Wang, Wu Yu

AU - Yang, Hai Gang

AU - Ding, Peng

AU - Hao, Wei Chang

AU - Wang, Tian Min

PY - 2008/10

Y1 - 2008/10

N2 - In this paper, it is introduced that using a cooling apparatus based on liquid nitrogen, we have prepared NiOx films with nano-microcrystalline structure by reactive magnetron sputtering. X-ray diffiration (XRD) and Images of scanning electron microscope (SEM) demonstrate that when we employ equal sputtering parameters, using this method, we can effectively regulate or control grain size of NiOx films with nano-microcrystalline structure.

AB - In this paper, it is introduced that using a cooling apparatus based on liquid nitrogen, we have prepared NiOx films with nano-microcrystalline structure by reactive magnetron sputtering. X-ray diffiration (XRD) and Images of scanning electron microscope (SEM) demonstrate that when we employ equal sputtering parameters, using this method, we can effectively regulate or control grain size of NiOx films with nano-microcrystalline structure.

KW - Magnetron sputtering

KW - Nano-microcrystalline structure

KW - NiO films

UR - https://www.scopus.com/pages/publications/56349111110

M3 - 文章

AN - SCOPUS:56349111110

SN - 1001-9731

VL - 39

SP - 1618

EP - 1621

JO - Gongneng Cailiao/Journal of Functional Materials

JF - Gongneng Cailiao/Journal of Functional Materials

IS - 10

ER -

Preparation of nano-microcrystalline NiO_x films by magnetron sputtering and cooling substrates

Abstract

Keywords

Other files and links

Fingerprint

Cite this