Preparation and properties of electrochromic device of ITO/WO3/LiTaO3/NiOx/ITO in full solid film

Jinwei Zhang; Xungang Diao; Huaiyi Wang; Tianmin Wang; Zhe Wu; Yuanjie Shu

Preparation and properties of electrochromic device of ITO/WO3/LiTaO3/NiOx/ITO in full solid film

Jinwei Zhang^*
, Xungang Diao
, Huaiyi Wang
, Tianmin Wang
, Zhe Wu
, Yuanjie Shu

^*Corresponding author for this work

Beihang University
China Academy of Engineering Physics

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

WO₃, LiTaO₃, NiO_x, ITO films were respectively deposited by magnetron sputtering at room temperature and different liquid nitrogen flux cooling, of which the electrochromic in full solid film consists. XRD, SEM, spectrophotometer were used to analyze the films. The Results reveal that the WO₃ films made at low temperature are amorphous that is of benefit for Li⁺ to inject and eject. The average transmittance variation of WO₃ film between bleached and colored state can reach 70% at 400-800 nm. The LiTaO₃ films have smaller granularity and closed structure. Low temperature can create more Ni²⁺ to participate the electrochromic reaction and more pore for the H⁺ to inject and eject. The device exhibits remarkable electrochromic characteristic.

Original language	English
Pages (from-to)	1688-1692
Number of pages	5
Journal	Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume	37
Issue number	9
State	Published - Sep 2008

Keywords

Electrochromic device
Liquid Nitrogen
Low temperature
Magnetron sputtering

Cite this

@article{1b39c5ab113f482c9650d1319c926fed,

title = "Preparation and properties of electrochromic device of ITO/WO3/LiTaO3/NiOx/ITO in full solid film",

abstract = "WO3, LiTaO3, NiOx, ITO films were respectively deposited by magnetron sputtering at room temperature and different liquid nitrogen flux cooling, of which the electrochromic in full solid film consists. XRD, SEM, spectrophotometer were used to analyze the films. The Results reveal that the WO3 films made at low temperature are amorphous that is of benefit for Li+ to inject and eject. The average transmittance variation of WO3 film between bleached and colored state can reach 70\% at 400-800 nm. The LiTaO3 films have smaller granularity and closed structure. Low temperature can create more Ni2+ to participate the electrochromic reaction and more pore for the H+ to inject and eject. The device exhibits remarkable electrochromic characteristic.",

keywords = "Electrochromic device, Liquid Nitrogen, Low temperature, Magnetron sputtering",

author = "Jinwei Zhang and Xungang Diao and Huaiyi Wang and Tianmin Wang and Zhe Wu and Yuanjie Shu",

year = "2008",

month = sep,

language = "英语",

volume = "37",

pages = "1688--1692",

journal = "Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering",

issn = "1002-185X",

publisher = "Science Press ",

number = "9",

}

TY - JOUR

T1 - Preparation and properties of electrochromic device of ITO/WO3/LiTaO3/NiOx/ITO in full solid film

AU - Zhang, Jinwei

AU - Diao, Xungang

AU - Wang, Huaiyi

AU - Wang, Tianmin

AU - Wu, Zhe

AU - Shu, Yuanjie

PY - 2008/9

Y1 - 2008/9

N2 - WO3, LiTaO3, NiOx, ITO films were respectively deposited by magnetron sputtering at room temperature and different liquid nitrogen flux cooling, of which the electrochromic in full solid film consists. XRD, SEM, spectrophotometer were used to analyze the films. The Results reveal that the WO3 films made at low temperature are amorphous that is of benefit for Li+ to inject and eject. The average transmittance variation of WO3 film between bleached and colored state can reach 70% at 400-800 nm. The LiTaO3 films have smaller granularity and closed structure. Low temperature can create more Ni2+ to participate the electrochromic reaction and more pore for the H+ to inject and eject. The device exhibits remarkable electrochromic characteristic.

AB - WO3, LiTaO3, NiOx, ITO films were respectively deposited by magnetron sputtering at room temperature and different liquid nitrogen flux cooling, of which the electrochromic in full solid film consists. XRD, SEM, spectrophotometer were used to analyze the films. The Results reveal that the WO3 films made at low temperature are amorphous that is of benefit for Li+ to inject and eject. The average transmittance variation of WO3 film between bleached and colored state can reach 70% at 400-800 nm. The LiTaO3 films have smaller granularity and closed structure. Low temperature can create more Ni2+ to participate the electrochromic reaction and more pore for the H+ to inject and eject. The device exhibits remarkable electrochromic characteristic.

KW - Electrochromic device

KW - Liquid Nitrogen

KW - Low temperature

KW - Magnetron sputtering

UR - https://www.scopus.com/pages/publications/55149094530

M3 - 文章

AN - SCOPUS:55149094530

SN - 1002-185X

VL - 37

SP - 1688

EP - 1692

JO - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

JF - Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering

IS - 9

ER -

Preparation and properties of electrochromic device of ITO/WO3/LiTaO3/NiOx/ITO in full solid film

Abstract

Keywords

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