Skip to main navigation Skip to search Skip to main content

Photocopy technology in producing patterned alignment layer

  • Tao Du*
  • , Fan Fan
  • , Qi Guo
  • , Vladimir Chigrinov
  • , Hoi Sing Kwok
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this paper, a method of using photocopy technology in producing patterned alignment layer has been proposed, which is capable of copying any possible alignment patterns with the size as small as 2μm. A patterned polarizer made of quarter wave plates using photoalignment technology is used to transfer the alignment patterns to the photoalignment layer.

Original languageEnglish
Title of host publication49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011
Pages948-949
Number of pages2
StatePublished - 2011
Externally publishedYes
Event49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011 - Los Angeles, CA, United States
Duration: 15 May 201120 May 2011

Publication series

Name49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011
Volume2

Conference

Conference49th Annual SID Symposium, Seminar, and Exhibition 2011, Display Week 2011
Country/TerritoryUnited States
CityLos Angeles, CA
Period15/05/1120/05/11

Fingerprint

Dive into the research topics of 'Photocopy technology in producing patterned alignment layer'. Together they form a unique fingerprint.

Cite this