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Photo-catalytic activity of Cu2O films with various crystal structures prepared by DC reactive magnetron sputtering

  • Hailing Zhu*
  • , Junying Zhang
  • , Xiang Lan
  • , Chunzhi Li
  • , Tianmin Wang
  • , Baibiao Huang
  • *Corresponding author for this work
  • Beihang University
  • Shandong University

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The direct current (DC) reactive magnetron sputtering of a metal copper target in oxygen-argon mixed atmospheres to produce thin films of crystalline copper oxides was described. The sputtering pressure, sputtering power and oxygen flow rate were established in order to control the structures and properties of Cu2O films. The as-deposited Cu2O films with various crystal structures have high visible absorption and photo-catalytic activity under visible light irradiation. The photo-catalytic properties of Cu2O films are affected by not only the crystal structure but also the surface morphology.

Original languageEnglish
Title of host publicationMaterials Research
EditorsZhongwei Gu, Zhongwei Gu, Zhongwei Gu, Yafang Han, Yafang Han, Yafang Han, Fusheng Pan, Fusheng Pan, Fusheng Pan, Fusheng Pan, Fusheng Pan, Fusheng Pan, Xitao Wang, Xitao Wang, Xitao Wang, Duan Weng, Duan Weng, Duan Weng, Shaoxiong Zhou, Shaoxiong Zhou, Shaoxiong Zhou
PublisherTrans Tech Publications Ltd
Pages293-298
Number of pages6
ISBN (Print)9780878493401, 9780878493401, 9780878493401
DOIs
StatePublished - 2009
EventMRS International Materials Research Conference, IMRC 2008 - Chongqing, China
Duration: 9 Jun 200812 Jun 2008

Publication series

NameMaterials Science Forum
Volume610-613
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

ConferenceMRS International Materials Research Conference, IMRC 2008
Country/TerritoryChina
CityChongqing
Period9/06/0812/06/08

Keywords

  • CuO film
  • DC reactive magnetron sputtering
  • Oxygen flow rate
  • Photo-catalytic activity
  • Sputtering power
  • Sputtering pressure

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