Patterned wettability transition by photoelectric cooperative and anisotropic wetting for liquid reprography

Dongliang Tian; Qinwen Chen; Fu Qiang Nie; Jinjie Xu; Yanlin Song; Lei Jiang

doi:10.1002/adma.200900022

Patterned wettability transition by photoelectric cooperative and anisotropic wetting for liquid reprography

Dongliang Tian^*
, Qinwen Chen
, Fu Qiang Nie
, Jinjie Xu
, Yanlin Song
, Lei Jiang

^*Corresponding author for this work

National Center for Nanoscience and Technology
Chinese Academy of Sciences

Research output: Contribution to journal › Article › peer-review

125 Scopus citations

Abstract

An approach to address the precise controllable patterned wettability transition on the superhydrophoblc aligned photoconductive nanorod-array surface via a photoelectric cooperative wetting process Is described. This work Is promising to gear up the application of locally confining liquids at a desired location, such as liquid reprography by patternedlight Illumination.

Original language	English
Pages (from-to)	3744-3749
Number of pages	6
Journal	Advanced Materials
Volume	21
Issue number	37
DOIs	https://doi.org/10.1002/adma.200900022
State	Published - 2009
Externally published	Yes

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10.1002/adma.200900022

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@article{5f99284ac20f4eb29b10fe310ff4ba84,

title = "Patterned wettability transition by photoelectric cooperative and anisotropic wetting for liquid reprography",

abstract = "An approach to address the precise controllable patterned wettability transition on the superhydrophoblc aligned photoconductive nanorod-array surface via a photoelectric cooperative wetting process Is described. This work Is promising to gear up the application of locally confining liquids at a desired location, such as liquid reprography by patternedlight Illumination.",

author = "Dongliang Tian and Qinwen Chen and Nie, \{Fu Qiang\} and Jinjie Xu and Yanlin Song and Lei Jiang",

year = "2009",

doi = "10.1002/adma.200900022",

language = "英语",

volume = "21",

pages = "3744--3749",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-Blackwell",

number = "37",

}

TY - JOUR

T1 - Patterned wettability transition by photoelectric cooperative and anisotropic wetting for liquid reprography

AU - Tian, Dongliang

AU - Chen, Qinwen

AU - Nie, Fu Qiang

AU - Xu, Jinjie

AU - Song, Yanlin

AU - Jiang, Lei

PY - 2009

Y1 - 2009

N2 - An approach to address the precise controllable patterned wettability transition on the superhydrophoblc aligned photoconductive nanorod-array surface via a photoelectric cooperative wetting process Is described. This work Is promising to gear up the application of locally confining liquids at a desired location, such as liquid reprography by patternedlight Illumination.

AB - An approach to address the precise controllable patterned wettability transition on the superhydrophoblc aligned photoconductive nanorod-array surface via a photoelectric cooperative wetting process Is described. This work Is promising to gear up the application of locally confining liquids at a desired location, such as liquid reprography by patternedlight Illumination.

UR - https://www.scopus.com/pages/publications/70349777493

U2 - 10.1002/adma.200900022

DO - 10.1002/adma.200900022

M3 - 文章

AN - SCOPUS:70349777493

SN - 0935-9648

VL - 21

SP - 3744

EP - 3749

JO - Advanced Materials

JF - Advanced Materials

IS - 37

ER -

Patterned wettability transition by photoelectric cooperative and anisotropic wetting for liquid reprography

Abstract

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