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Oxygen atom diffusion-driven anomalous Hall behavior in Co/Pt multilayers

  • Shao Long Jiang
  • , Xi Chen
  • , Jing Yan Zhang
  • , Guang Yang
  • , Jiao Teng
  • , Xu Jing Li
  • , Yi Cao
  • , Qian Qian Liu
  • , Kang Yang
  • , Chen Hu
  • , Guang Hua Yu*
  • *Corresponding author for this work
  • University of Science and Technology Beijing

Research output: Contribution to journalArticlepeer-review

Abstract

Abstract Anomalous Hall effect (AHE) studies have been carried out in Co/Pt multilayers prepared by magnetron sputtering under annealing. The AHE behavior can be deteriorated by annealing in Pt/[Co/Pt]3/Pt thin films, while saturation anomalous Hall resistivity in MgO/[Co/Pt]3/MgO multilayers after annealing at 623 K for 30 min is 124% larger than that in the as-deposited films. The X-ray photoelectron spectroscopy analysis exhibits that the increased AHE is primarily ascribed to annealing dependent oxygen atom diffusion at the Co/MgO interface.

Original languageEnglish
Article number34144
Pages (from-to)123-126
Number of pages4
JournalThin Solid Films
Volume579
DOIs
StatePublished - 31 Mar 2015
Externally publishedYes

Keywords

  • Anomalous Hall effect
  • Co/Pt multilayers
  • Oxygen atom diffusion
  • X-ray photoelectron spectroscopy

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