Optimal design of the magnetic field in a multi-target magnetron sputtering system

Enjing Pang; Ying Zhu; Fen Li; Liuhe Li; Qiuyuan Lu; Paul K. Chu

Optimal design of the magnetic field in a multi-target magnetron sputtering system

Enjing Pang^*
, Ying Zhu
, Fen Li
, Liuhe Li
, Qiuyuan Lu
, Paul K. Chu

^*Corresponding author for this work

School of Mechanical Engineering and Automation

Beihang University
City University of Hong Kong

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

In magnetron sputtering, the magnetic field determines the sputtering stability, ionization rate, target utilization coefficient and films quality. Reasonable magnetic field distribution leads to a glow discharge distribution of desirable uniformity, hence improved target sputtering rate at different areas, extended sputtering area, prolonged target life and increased stability of the sputtering process. In this paper, the magnetic field of a hexagon target system is optimized by finite element method, and this provides a theoretic basis for optimization of the magnetron sputtering system.

Original language	English
Pages (from-to)	908-912
Number of pages	5
Journal	He Jishu/Nuclear Techniques
Volume	33
Issue number	12
State	Published - Dec 2010

Keywords

Finite element simulation
Magnetic field
Multi-target

Cite this

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title = "Optimal design of the magnetic field in a multi-target magnetron sputtering system",

abstract = "In magnetron sputtering, the magnetic field determines the sputtering stability, ionization rate, target utilization coefficient and films quality. Reasonable magnetic field distribution leads to a glow discharge distribution of desirable uniformity, hence improved target sputtering rate at different areas, extended sputtering area, prolonged target life and increased stability of the sputtering process. In this paper, the magnetic field of a hexagon target system is optimized by finite element method, and this provides a theoretic basis for optimization of the magnetron sputtering system.",

keywords = "Finite element simulation, Magnetic field, Multi-target",

author = "Enjing Pang and Ying Zhu and Fen Li and Liuhe Li and Qiuyuan Lu and Chu, \{Paul K.\}",

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pages = "908--912",

journal = "He Jishu/Nuclear Techniques",

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T1 - Optimal design of the magnetic field in a multi-target magnetron sputtering system

AU - Pang, Enjing

AU - Zhu, Ying

AU - Li, Fen

AU - Li, Liuhe

AU - Lu, Qiuyuan

AU - Chu, Paul K.

PY - 2010/12

Y1 - 2010/12

N2 - In magnetron sputtering, the magnetic field determines the sputtering stability, ionization rate, target utilization coefficient and films quality. Reasonable magnetic field distribution leads to a glow discharge distribution of desirable uniformity, hence improved target sputtering rate at different areas, extended sputtering area, prolonged target life and increased stability of the sputtering process. In this paper, the magnetic field of a hexagon target system is optimized by finite element method, and this provides a theoretic basis for optimization of the magnetron sputtering system.

AB - In magnetron sputtering, the magnetic field determines the sputtering stability, ionization rate, target utilization coefficient and films quality. Reasonable magnetic field distribution leads to a glow discharge distribution of desirable uniformity, hence improved target sputtering rate at different areas, extended sputtering area, prolonged target life and increased stability of the sputtering process. In this paper, the magnetic field of a hexagon target system is optimized by finite element method, and this provides a theoretic basis for optimization of the magnetron sputtering system.

KW - Finite element simulation

KW - Magnetic field

KW - Multi-target

UR - https://www.scopus.com/pages/publications/78651086804

M3 - 文章

AN - SCOPUS:78651086804

SN - 0253-3219

VL - 33

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EP - 912

JO - He Jishu/Nuclear Techniques

JF - He Jishu/Nuclear Techniques

IS - 12

ER -

Optimal design of the magnetic field in a multi-target magnetron sputtering system

Abstract

Keywords

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