Nb2SiTe4: A Stable Narrow-Gap Two-Dimensional Material with Ambipolar Transport and Mid-Infrared Response

  • Mingxing Zhao
  • , Wei Xia
  • , Yang Wang
  • , Man Luo
  • , Zhen Tian
  • , Yanfeng Guo*
  • , Weida Hu
  • , Jiamin Xue
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Two-dimensional (2D) materials with narrow band gaps (â¼0.3 eV) are of great importance for realizing ambipolar transistors and mid-infrared (MIR) detections. However, most of the 2D materials studied to date have band gaps that are too large. A few of the materials with suitable band gaps are not stable under ambient conditions. In this study, the layered Nb2SiTe4 is shown to be a stable 2D material with a band gap of 0.39 eV. Field-effect transistors based on few-layer Nb2SiTe4 show ambipolar transport with a similar magnitude of electron and hole current and a high charge-carrier mobility of â¼100 cm2 V-1 s-1 at room temperature. Optoelectronic measurements of the devices show clear response to an MIR wavelength of 3.1 μm with a high responsivity of â¼0.66 AW-1. These results establish Nb2SiTe4 as a good candidate for ambipolar devices and MIR detection.

Original languageEnglish
Pages (from-to)10705-10710
Number of pages6
JournalACS Nano
Volume13
Issue number9
DOIs
StatePublished - 24 Sep 2019
Externally publishedYes

Keywords

  • NbSiTe
  • ambipolar transistor
  • mid-infrared
  • narrow gap
  • stability
  • two-dimensional material

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