Abstract
Infrared photodetectors are widely used in the field of remote sensing, communications, biomedical imaging, etc. Most photodetection based on 2D transition-metal dichalcogenides (TMDs) is limited to the visible (Vis) to near-infrared (NIR) due to large intrinsic bandgaps (≈1.2–2 eV). Here, a bandgap engineering of HfS2 by a tellurium (Te)-replacement strategy is obtained via chemical vapor transport method. The bandgap values of HfS2(1−x)Te2x decrease from 1.7 to 0.88 eV with Te composition changing from 0 to 0.095. Few-layer HfS1.81Te0.19 based field-effect transistors exhibit a high current on/off ratio of 106 and decent electron mobility of 12.6 cm2 V−1 s−1 at room temperature. The photodetectors show a responsivity of 2 A W−1 with a remarkable photocurrent of ≈3 μA and a fast response speed of 8.8/75 ms at 830 nm simultaneously. Further, the response spectrum of HfS2(1−x)Te2x based photodetectors is broadened from Vis to short-wavelength infrared (SWIR), covering the free-space laser communications wavelength and the second NIR region in medicine. Bandgap engineering of 2D TMDs proposed in this work offer a promising route to develop bandgap-variable 2D materials for infrared photodetection applications.
| Original language | English |
|---|---|
| Article number | 2002248 |
| Journal | Advanced Optical Materials |
| Volume | 9 |
| Issue number | 11 |
| DOIs | |
| State | Published - 4 Jun 2021 |
| Externally published | Yes |
Keywords
- bandgap engineering
- HfS, infrared photodetectors
- transition-metal dichalcogenides
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