Skip to main navigation Skip to search Skip to main content

Nanoporous Films with Sub-10 nm in Pore Size from Acid-Cleavable Block Copolymers

  • Yayuan Li
  • , Yawei Xu
  • , Shubo Cao
  • , Yongbin Zhao
  • , Ting Qu
  • , Tomokazu Iyoda
  • , Aihua Chen*
  • *Corresponding author for this work
  • Beihang University
  • Shandong Oubo New Material Co. Ltd
  • Institute of Science Tokyo

Research output: Contribution to journalArticlepeer-review

Abstract

Nanoporous thin films with pore size of sub-10 nm are fabricated using an acid-cleavable block copolymer (BCP), a benzoic imine junction between poly(ethylene oxide) (PEO) and poly(methacrylate) (PMAAz) bearing an azobenzene side chain (denoted as PEO-bei-PMAAz) as the precursor. After a thermal annealing, the block copolymers are self-assembled to form highly ordered PEO cylinders within a PMAAz matrix normal to the film, even in the case of low BCP molecular weight due to the existing of the liquid crystalline (LC) azobenzene rigid segment. Thus, PMAAz thin films with pore size of ≈7 nm and density of ≈1012 cm−2 are obtained after removal of the PEO minor phase by breaking the benzoic imine junction under mild acidic conditions. This work enriches the nanoporous polymer films from BCP precursors and introduces the LC property as a functionality which can further enhance the mechanical properties of the films and broaden their applications. (Figure presented.).

Original languageEnglish
Article number1600662
JournalMacromolecular Rapid Communications
Volume38
Issue number5
DOIs
StatePublished - 1 Mar 2017

Keywords

  • block copolymer
  • nanoporous film
  • self-assembly
  • sub-10 nm

Fingerprint

Dive into the research topics of 'Nanoporous Films with Sub-10 nm in Pore Size from Acid-Cleavable Block Copolymers'. Together they form a unique fingerprint.

Cite this