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Morphology and microstructure of tungsten films by magnetron sputtering

  • Beihang University
  • Key Laboratory of Precision Opto-Mechatronics Technology (Ministry of Education)

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

In this work, tungsten thin films were deposited on different substrates by magnetron sputtering and some of the films were then annealed at 1000℃ for 1 hour in order to investigate the influence of different processing parameters on morphology and microstructure of films. Scanning electron microscope and x-ray diffraction were used to detect the morphology and microstructure of films. Under the same conditions, the thin films on different substrates showed different preferred grain orientations although the morphologies were similar. After thermal treatment, the morphology of films changed significantly and the total stress parallel to film surfaces dropped off sharply.

Original languageEnglish
Title of host publicationFunctional and Functionally Structured Materials II - Chinese Materials Conference 2017, CMC 2017
EditorsYa Fang Han
PublisherTrans Tech Publications Ltd
Pages416-423
Number of pages8
ISBN (Print)9783035712445
DOIs
StatePublished - 2018
EventChinese Materials Conference, CMC 2017 - Yinchuan City, Ningxia, China
Duration: 6 Jul 201812 Jul 2018

Publication series

NameMaterials Science Forum
Volume913
ISSN (Print)0255-5476
ISSN (Electronic)1662-9752

Conference

ConferenceChinese Materials Conference, CMC 2017
Country/TerritoryChina
CityYinchuan City, Ningxia
Period6/07/1812/07/18

Keywords

  • Annealing
  • Magnetron sputtering
  • Preferred grain orientation
  • Tungsten thin films

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