Microstructure and mechanical properties of Ti-Si-N nanocomposite coating prepared by DC magnetron sputtering

Ye Xu; Liu He Li; Xun Cai; Qiu Long Chen; Paul K. Chu

Microstructure and mechanical properties of Ti-Si-N nanocomposite coating prepared by DC magnetron sputtering

Ye Xu^*
, Liu He Li
, Xun Cai
, Qiu Long Chen
, Paul K. Chu

^*Corresponding author for this work

School of Mechanical Engineering and Automation

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

Hard nanocomposite Ti-Si-N films were deposited on 321 stainless steel substrate by direct current (DC) reactive magnetron sputtering using a Ti-Si mosaic target consisting of a Ti plate and Si chips. The composition, microstructure and mechanical properties were investigated using EDX, XRD, XPS, AFM, nano-indentation and scratch test. The results indicate that the hardness of Ti-Si-N gradually rises with the increasing Si contents in the layer until the peak value of 42 GPa appears corresponding to the Si content of 11.2%. The hardness then decreases with further increasing of the Si content. XRD, XPS, and AFM reveal that the hardest Ti-Si-N film consists of fine TiN crystallites (approximately 8 nm in size) surrounded by amorphous Si₃N₄. The preferential growth of TiN is indicated in the XRD patterns. All the Ti-Si-N films show high adhesive strength indicated by the scratch tests. The strengthening mechanism of such nanocomposite films was also discussed.

Original language	English
Pages (from-to)	452-456
Number of pages	5
Journal	Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University
Volume	41
Issue number	3
State	Published - Mar 2007

Keywords

Adhesive strength
Microstructure
Nanohardness
Ti-Si-N nanocomposite film

Cite this

@article{33d18fa4abed4ccd94fe7709a4f1fdcd,

title = "Microstructure and mechanical properties of Ti-Si-N nanocomposite coating prepared by DC magnetron sputtering",

abstract = "Hard nanocomposite Ti-Si-N films were deposited on 321 stainless steel substrate by direct current (DC) reactive magnetron sputtering using a Ti-Si mosaic target consisting of a Ti plate and Si chips. The composition, microstructure and mechanical properties were investigated using EDX, XRD, XPS, AFM, nano-indentation and scratch test. The results indicate that the hardness of Ti-Si-N gradually rises with the increasing Si contents in the layer until the peak value of 42 GPa appears corresponding to the Si content of 11.2\%. The hardness then decreases with further increasing of the Si content. XRD, XPS, and AFM reveal that the hardest Ti-Si-N film consists of fine TiN crystallites (approximately 8 nm in size) surrounded by amorphous Si3N4. The preferential growth of TiN is indicated in the XRD patterns. All the Ti-Si-N films show high adhesive strength indicated by the scratch tests. The strengthening mechanism of such nanocomposite films was also discussed.",

keywords = "Adhesive strength, Microstructure, Nanohardness, Ti-Si-N nanocomposite film",

author = "Ye Xu and Li, \{Liu He\} and Xun Cai and Chen, \{Qiu Long\} and Chu, \{Paul K.\}",

year = "2007",

month = mar,

language = "英语",

volume = "41",

pages = "452--456",

journal = "Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University",

issn = "1006-2467",

publisher = "Shanghai Jiaotong University",

number = "3",

}

TY - JOUR

T1 - Microstructure and mechanical properties of Ti-Si-N nanocomposite coating prepared by DC magnetron sputtering

AU - Xu, Ye

AU - Li, Liu He

AU - Cai, Xun

AU - Chen, Qiu Long

AU - Chu, Paul K.

PY - 2007/3

Y1 - 2007/3

N2 - Hard nanocomposite Ti-Si-N films were deposited on 321 stainless steel substrate by direct current (DC) reactive magnetron sputtering using a Ti-Si mosaic target consisting of a Ti plate and Si chips. The composition, microstructure and mechanical properties were investigated using EDX, XRD, XPS, AFM, nano-indentation and scratch test. The results indicate that the hardness of Ti-Si-N gradually rises with the increasing Si contents in the layer until the peak value of 42 GPa appears corresponding to the Si content of 11.2%. The hardness then decreases with further increasing of the Si content. XRD, XPS, and AFM reveal that the hardest Ti-Si-N film consists of fine TiN crystallites (approximately 8 nm in size) surrounded by amorphous Si3N4. The preferential growth of TiN is indicated in the XRD patterns. All the Ti-Si-N films show high adhesive strength indicated by the scratch tests. The strengthening mechanism of such nanocomposite films was also discussed.

AB - Hard nanocomposite Ti-Si-N films were deposited on 321 stainless steel substrate by direct current (DC) reactive magnetron sputtering using a Ti-Si mosaic target consisting of a Ti plate and Si chips. The composition, microstructure and mechanical properties were investigated using EDX, XRD, XPS, AFM, nano-indentation and scratch test. The results indicate that the hardness of Ti-Si-N gradually rises with the increasing Si contents in the layer until the peak value of 42 GPa appears corresponding to the Si content of 11.2%. The hardness then decreases with further increasing of the Si content. XRD, XPS, and AFM reveal that the hardest Ti-Si-N film consists of fine TiN crystallites (approximately 8 nm in size) surrounded by amorphous Si3N4. The preferential growth of TiN is indicated in the XRD patterns. All the Ti-Si-N films show high adhesive strength indicated by the scratch tests. The strengthening mechanism of such nanocomposite films was also discussed.

KW - Adhesive strength

KW - Microstructure

KW - Nanohardness

KW - Ti-Si-N nanocomposite film

UR - https://www.scopus.com/pages/publications/34248677335

M3 - 文章

AN - SCOPUS:34248677335

SN - 1006-2467

VL - 41

SP - 452

EP - 456

JO - Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University

JF - Shanghai Jiaotong Daxue Xuebao/Journal of Shanghai Jiaotong University

IS - 3

ER -

Microstructure and mechanical properties of Ti-Si-N nanocomposite coating prepared by DC magnetron sputtering

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Keywords

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