Microstructural improvement of sputtered ZrO2 thin films by substrate biasing

A. P. Huang; Paul K. Chu

doi:10.1016/j.mseb.2005.04.002

Microstructural improvement of sputtered ZrO₂ thin films by substrate biasing

A. P. Huang
, Paul K. Chu^*

^*Corresponding author for this work

City University of Hong Kong

Research output: Contribution to journal › Article › peer-review

18 Scopus citations

Abstract

We have fabricated zirconia (ZrO₂) thin films on Si(1 0 0) wafers that possess excellent crystallinity and orientation. Furthermore, the interfacial properties between the thin films and Si substrate have been improved by means of substrate biasing. The influence of the substrate bias on the interfacial and microstructural characteristics of the ZrO₂ thin films has been investigated in details. Our results show that by applying a suitable bias to the Si substrate, the microstructure of ZrO₂ thin films becomes more ordered and the interfacial by-products can be suppressed. The effects and mechanism of the bias on the microstructure of the thin films are described.

Original language	English
Pages (from-to)	244-247
Number of pages	4
Journal	Materials Science and Engineering: B
Volume	121
Issue number	3
DOIs	https://doi.org/10.1016/j.mseb.2005.04.002
State	Published - 15 Aug 2005
Externally published	Yes

Keywords

Dielectrics
Sputtering
Substrate bias
ZrO

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10.1016/j.mseb.2005.04.002

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title = "Microstructural improvement of sputtered ZrO2 thin films by substrate biasing",

abstract = "We have fabricated zirconia (ZrO2) thin films on Si(1 0 0) wafers that possess excellent crystallinity and orientation. Furthermore, the interfacial properties between the thin films and Si substrate have been improved by means of substrate biasing. The influence of the substrate bias on the interfacial and microstructural characteristics of the ZrO2 thin films has been investigated in details. Our results show that by applying a suitable bias to the Si substrate, the microstructure of ZrO2 thin films becomes more ordered and the interfacial by-products can be suppressed. The effects and mechanism of the bias on the microstructure of the thin films are described.",

keywords = "Dielectrics, Sputtering, Substrate bias, ZrO",

author = "Huang, \{A. P.\} and Chu, \{Paul K.\}",

year = "2005",

month = aug,

day = "15",

doi = "10.1016/j.mseb.2005.04.002",

language = "英语",

volume = "121",

pages = "244--247",

journal = "Materials Science and Engineering: B",

issn = "0921-5107",

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TY - JOUR

T1 - Microstructural improvement of sputtered ZrO2 thin films by substrate biasing

AU - Huang, A. P.

AU - Chu, Paul K.

PY - 2005/8/15

Y1 - 2005/8/15

N2 - We have fabricated zirconia (ZrO2) thin films on Si(1 0 0) wafers that possess excellent crystallinity and orientation. Furthermore, the interfacial properties between the thin films and Si substrate have been improved by means of substrate biasing. The influence of the substrate bias on the interfacial and microstructural characteristics of the ZrO2 thin films has been investigated in details. Our results show that by applying a suitable bias to the Si substrate, the microstructure of ZrO2 thin films becomes more ordered and the interfacial by-products can be suppressed. The effects and mechanism of the bias on the microstructure of the thin films are described.

AB - We have fabricated zirconia (ZrO2) thin films on Si(1 0 0) wafers that possess excellent crystallinity and orientation. Furthermore, the interfacial properties between the thin films and Si substrate have been improved by means of substrate biasing. The influence of the substrate bias on the interfacial and microstructural characteristics of the ZrO2 thin films has been investigated in details. Our results show that by applying a suitable bias to the Si substrate, the microstructure of ZrO2 thin films becomes more ordered and the interfacial by-products can be suppressed. The effects and mechanism of the bias on the microstructure of the thin films are described.

KW - Dielectrics

KW - Sputtering

KW - Substrate bias

KW - ZrO

UR - https://www.scopus.com/pages/publications/20344382754

U2 - 10.1016/j.mseb.2005.04.002

DO - 10.1016/j.mseb.2005.04.002

M3 - 文章

AN - SCOPUS:20344382754

SN - 0921-5107

VL - 121

SP - 244

EP - 247

JO - Materials Science and Engineering: B

JF - Materials Science and Engineering: B

IS - 3

ER -

Microstructural improvement of sputtered ZrO₂ thin films by substrate biasing

Abstract

Keywords

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