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Mechano-fluorochromic behavior of AEE polyurethane films and their high sensitivity to halogen acid gas

  • Kun Wang
  • , Meng Wang
  • , Hao Lu
  • , Beibei Liu
  • , Mingming Huang
  • , Jiping Yang*
  • *Corresponding author for this work

Research output: Contribution to journalArticlepeer-review

Abstract

Three polyurethanes with different contents of tetraaryl-buta-1,3-diene derivatives in the soft segment (STMPU-25/STMPU-50/STMPU-75) have been synthesized and found to present aggregation-enhanced emission features. The fluorescence intensity of polymer films was greatly enhanced with increasing tensile stress. Also, polyurethanes with higher aggregation-induced emission fluorogen content had stronger mechano-fluorochromic behavior in the same tension state. Moreover, the resulting polyurethane films possessed high sensitivity for halogen acid gas, suggesting their potential applications in environmental monitoring fields.

Original languageEnglish
Pages (from-to)9517-9521
Number of pages5
JournalRSC Advances
Volume9
Issue number17
DOIs
StatePublished - 2019

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