Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

X. Wang; J. Wang; S. Yang

doi:10.1179/1432891714Z.000000000871

Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

X. Wang
, J. Wang^*
, S. Yang

^*Corresponding author for this work

School of Physics

Beihang University

Research output: Contribution to journal › Article › peer-review

2 Scopus citations

Abstract

In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.

Original language	English
Pages (from-to)	S41017-S41020
Journal	Materials Research Innovations
Volume	18
DOIs	https://doi.org/10.1179/1432891714Z.000000000871
State	Published - 1 Jul 2014

Keywords

Finite element method
Hydrogenated nanocrystalline silicon thin
Mechanical properties

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10.1179/1432891714Z.000000000871

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title = "Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method",

abstract = "In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.",

keywords = "Finite element method, Hydrogenated nanocrystalline silicon thin, Mechanical properties",

author = "X. Wang and J. Wang and S. Yang",

note = "Publisher Copyright: {\textcopyright} W. S. Maney \& Son Ltd. 2014.",

year = "2014",

month = jul,

day = "1",

doi = "10.1179/1432891714Z.000000000871",

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volume = "18",

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TY - JOUR

T1 - Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

AU - Wang, X.

AU - Wang, J.

AU - Yang, S.

PY - 2014/7/1

Y1 - 2014/7/1

N2 - In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.

AB - In this research, hydrogenated nanocrystalline silicon (nc-Si:H) thin films were fabricated by using plasma enhanced chemical vapour deposition system. The finite element model of nanoindentation was established to simulate the mechanical properties of a nc-Si:H thin film. By comparing numerical simulation data with experimental data, the correctness of the model was validated. The mechanical properties of nc-Si:H thin films obtained were: Young's modulus of 45 GPa, yield stress of 4·5 MPa, Poisson's ratio of 0·3 and the hardness was calculated to be 2·5 GPa.

KW - Finite element method

KW - Hydrogenated nanocrystalline silicon thin

KW - Mechanical properties

UR - https://www.scopus.com/pages/publications/84907821801

U2 - 10.1179/1432891714Z.000000000871

DO - 10.1179/1432891714Z.000000000871

M3 - 文章

AN - SCOPUS:84907821801

SN - 1432-8917

VL - 18

SP - S41017-S41020

JO - Materials Research Innovations

JF - Materials Research Innovations

ER -

Mechanical properties of hydrogenated nanocrystalline silicon thin film studied by finite element method

Abstract

Keywords

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