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Maximum Entropy Adversarial Learning for Generalizable Forgery Detection

  • Hongxing Fan
  • , Jiangtao Wu
  • , Weinan Guan
  • , Lu Sheng*
  • *Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The generalization of deepfake detectors to unseen manipulation methods is a critical challenge due to model overfitting on method-specific patterns. While adversarial learning is a common remedy, its conventional error-driven objective is flawed because it only encourages a discriminator to be wrong, which can be achieved without merging the distinct feature clusters of different forgery types. We argue for a paradigm shift from making the discriminator wrong to making it utterly confused. To this end, we propose Maximum Entropy Adversarial (MEA) learning, where the feature extractor is trained to generate features that maximize the entropy of the discriminator’s predictions. This objective, by driving the output distribution towards uniformity, compels the learning of a truly unified, method-agnostic representation by collapsing different forgery features into a single cluster. MEA is the core of a synergistic framework, bolstered by a Supervised Contrastive loss to maintain a clear real-vs-fake margin, and a novel Adversarially-Guided Feature Augmentation (AGFA) that creates challenging boundary samples to strengthen generalization. Extensive experiments on benchmarks like Celeb-DF and DFDC validate our approach, demonstrating our method’s superior generalization.

Original languageEnglish
Title of host publicationPattern Recognition and Computer Vision - 8th Chinese Conference, PRCV 2025, Proceedings
EditorsJosef Kittler, Hongkai Xiong, Weiyao Lin, Jian Yang, Xilin Chen, Jiwen Lu, Jingyi Yu, Weishi Zheng
PublisherSpringer Science and Business Media Deutschland GmbH
Pages298-312
Number of pages15
ISBN (Print)9789819556274
DOIs
StatePublished - 2026
Event8th Chinese Conference on Pattern Recognition and Computer Vision, PRCV 2025 - Shanghai, China
Duration: 15 Oct 202518 Oct 2025

Publication series

NameLecture Notes in Computer Science
Volume16286 LNCS
ISSN (Print)0302-9743
ISSN (Electronic)1611-3349

Conference

Conference8th Chinese Conference on Pattern Recognition and Computer Vision, PRCV 2025
Country/TerritoryChina
CityShanghai
Period15/10/2518/10/25

Keywords

  • Adversarial Learning
  • Deepfake Detection
  • Domain Generalization

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