Abstract
Crystallization property of amorphous GeTe can be significantly improved by doping Cu. However, the effect of Cu on the structure and electrical properties of crystalline GeTe is not clear, which is of great importance for phase-change memory. In this work, we have studied the effect of Cu on the structure and properties of crystalline GeTe by means of ab initio calculations. The results show that it is energetically favorable to obtain rhombohedral structured Cu nGe 32-m-nTe 32 films by co-sputtering defective Ge 32-mTe 32 and Cu as characterized by the negative formation energies. The doped Cu has slight effect on the structure property and chemical bonding of GeTe but has remarkable effect on the electrical properties. The results show that Cu nGe 32-nTe 32 alloys might be a good candidate material for phase-change memory.
| Original language | English |
|---|---|
| Pages (from-to) | 292-296 |
| Number of pages | 5 |
| Journal | Intermetallics |
| Volume | 32 |
| DOIs | |
| State | Published - Jan 2013 |
| Externally published | Yes |
Keywords
- A. Ternary alloy systems
- B. Electronic structure of metals and alloys
- D. Defects: constitutional vacancies
- E. Ab initio calculations
- E. Phase stability, prediction
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