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In Situ Tuning of Switching Window in a Gate-Controlled Bilayer Graphene-Electrode Resistive Memory Device

  • He Tian
  • , Haiming Zhao
  • , Xue Feng Wang
  • , Qian Yi Xie
  • , Hong Yu Chen
  • , Mohammad Ali Mohammad
  • , Cheng Li
  • , Wen Tian Mi
  • , Zhi Bie
  • , Chao Hui Yeh
  • , Yi Yang
  • , H. S.Philip Wong*
  • , Po Wen Chiu
  • , Tian Ling Ren
  • *Corresponding author for this work
  • Tsinghua University
  • Stanford University
  • National Tsing Hua University

Research output: Contribution to journalArticlepeer-review

Abstract

A resistive random access memory (RRAM) device with a tunable switching window is demonstrated for the first time. The SET voltage can be continuously tuned from 0.27 to 4.5 V by electrical gating from -10 to +35 V. The gate-controlled bilayer graphene-electrode RRAM can function as 1D1R and potentially increase the RRAM density.

Original languageEnglish
Pages (from-to)7767-7774
Number of pages8
JournalAdvanced Materials
Volume27
Issue number47
DOIs
StatePublished - 16 Dec 2015
Externally publishedYes

Keywords

  • bilayer graphene
  • gate controlled
  • in situ
  • resistive memory
  • switching windows

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