Hybrid evaporation: Glow discharge source for plasma immersion ion implantation

L. H. Li; R. W.Y. Poon; S. C.H. Kwok; P. K. Chu; Y. Q. Wu; Y. H. Zhang

doi:10.1063/1.1606535

Hybrid evaporation: Glow discharge source for plasma immersion ion implantation

L. H. Li
, R. W.Y. Poon
, S. C.H. Kwok
, P. K. Chu^*
, Y. Q. Wu
, Y. H. Zhang

^*Corresponding author for this work

School of Mechanical Engineering and Automation

City University of Hong Kong
Beihang University

Research output: Contribution to journal › Article › peer-review

22 Scopus citations

Abstract

A quasiequilibrium evaporation-glow dicharge evaporation source was developed for plasma immersion ion implantation. The relationship between the pressure in the evaporation chamber and the implantation chamber was studied for optimal performance. The results show that hybrid evaporation-glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure.

Original language	English
Pages (from-to)	4301-4304
Number of pages	4
Journal	Review of Scientific Instruments
Volume	74
Issue number	10
DOIs	https://doi.org/10.1063/1.1606535
State	Published - Oct 2003

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10.1063/1.1606535

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title = "Hybrid evaporation: Glow discharge source for plasma immersion ion implantation",

abstract = "A quasiequilibrium evaporation-glow dicharge evaporation source was developed for plasma immersion ion implantation. The relationship between the pressure in the evaporation chamber and the implantation chamber was studied for optimal performance. The results show that hybrid evaporation-glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure.",

author = "Li, \{L. H.\} and Poon, \{R. W.Y.\} and Kwok, \{S. C.H.\} and Chu, \{P. K.\} and Wu, \{Y. Q.\} and Zhang, \{Y. H.\}",

year = "2003",

month = oct,

doi = "10.1063/1.1606535",

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journal = "Review of Scientific Instruments",

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T1 - Hybrid evaporation

T2 - Glow discharge source for plasma immersion ion implantation

AU - Li, L. H.

AU - Poon, R. W.Y.

AU - Kwok, S. C.H.

AU - Chu, P. K.

AU - Wu, Y. Q.

AU - Zhang, Y. H.

PY - 2003/10

Y1 - 2003/10

N2 - A quasiequilibrium evaporation-glow dicharge evaporation source was developed for plasma immersion ion implantation. The relationship between the pressure in the evaporation chamber and the implantation chamber was studied for optimal performance. The results show that hybrid evaporation-glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure.

AB - A quasiequilibrium evaporation-glow dicharge evaporation source was developed for plasma immersion ion implantation. The relationship between the pressure in the evaporation chamber and the implantation chamber was studied for optimal performance. The results show that hybrid evaporation-glow discharge source is an effective method to produce ions from materials with low melting point and high vapor pressure.

UR - https://www.scopus.com/pages/publications/0142229425

U2 - 10.1063/1.1606535

DO - 10.1063/1.1606535

M3 - 文章

AN - SCOPUS:0142229425

SN - 0034-6748

VL - 74

SP - 4301

EP - 4304

JO - Review of Scientific Instruments

JF - Review of Scientific Instruments

IS - 10

ER -

Hybrid evaporation: Glow discharge source for plasma immersion ion implantation

Abstract

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