How to form regular polymer microstructures by surface-pattern-directed dewetting

Zexin Zhang; Zhe Wang; Rubo Xing; Yanchun Han

doi:10.1016/S0039-6028(03)00785-4

How to form regular polymer microstructures by surface-pattern-directed dewetting

Zexin Zhang
, Zhe Wang
, Rubo Xing
, Yanchun Han^*

^*Corresponding author for this work

CAS - Changchun Institute of Applied Chemistry

Research output: Contribution to journal › Article › peer-review

53 Scopus citations

Abstract

The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.

Original language	English
Pages (from-to)	129-136
Number of pages	8
Journal	Surface Science
Volume	539
Issue number	1-3
DOIs	https://doi.org/10.1016/S0039-6028(03)00785-4
State	Published - 1 Aug 2003
Externally published	Yes

Keywords

Atomic force microscopy
Self-assembly
Wetting

Access to Document

10.1016/S0039-6028(03)00785-4

Cite this

@article{fdf68ad8965e410997070ca7b3052af5,

title = "How to form regular polymer microstructures by surface-pattern-directed dewetting",

abstract = "The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.",

keywords = "Atomic force microscopy, Self-assembly, Wetting",

author = "Zexin Zhang and Zhe Wang and Rubo Xing and Yanchun Han",

year = "2003",

month = aug,

day = "1",

doi = "10.1016/S0039-6028(03)00785-4",

language = "英语",

volume = "539",

pages = "129--136",

journal = "Surface Science",

issn = "0039-6028",

publisher = "Elsevier B.V.",

number = "1-3",

}

TY - JOUR

T1 - How to form regular polymer microstructures by surface-pattern-directed dewetting

AU - Zhang, Zexin

AU - Wang, Zhe

AU - Xing, Rubo

AU - Han, Yanchun

PY - 2003/8/1

Y1 - 2003/8/1

N2 - The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.

AB - The substrates with regular patterns of self-assembly monolayers (SAMs) produced by microcontact printing with octadecyltrichlorosilane (OTS) was employed to direct thin polystyrene dewetting to fabricate ordered micrometer scale pattern. The pattern sizes and pattern fashion can be manipulated by controlling the experimental parameters. The pattern formation mechanisms have been discussed. The dewetting pattern can be transferred to form PDMS stamp for future microfabrication process.

KW - Atomic force microscopy

KW - Self-assembly

KW - Wetting

UR - https://www.scopus.com/pages/publications/0042164431

U2 - 10.1016/S0039-6028(03)00785-4

DO - 10.1016/S0039-6028(03)00785-4

M3 - 文章

AN - SCOPUS:0042164431

SN - 0039-6028

VL - 539

SP - 129

EP - 136

JO - Surface Science

JF - Surface Science

IS - 1-3

ER -

How to form regular polymer microstructures by surface-pattern-directed dewetting

Abstract

Keywords

Access to Document

Other files and links

Fingerprint

Cite this